Brewer Science, Inc., a leading supplier of advanced lithography materials, has released ARC® DS-K101P developer-soluble bottom anti-reflective coating (DBARC). This DBARC product has been formulated to meet the needs of the KrF photolithographer and augments processes where the resist budget is limited.
Building on a strong history of creating DBARCs, Brewer Science has developed a premium version of the successful Brewer Science® ARC® DS-K101 coating. ARC® DS-K101P KrF DBARC is designed to meet the tightening specifications of the 22-nm node and beyond. ARC® DS-K101P material has less than 1 ppb ions, while still maintaining the broad resist compatibly and tunability of the industry-proven ARC® DS-K101 coating. This new premium product will enable existing implant processes to transfer to future nodes.
“Brewer Science’s continuous improvement process supports customers with new leading-edge lithography products,” says Jim Lamb, Managing Director of Product Management at Brewer Science. “ARC® DS-K101P DBARC was created to give customers a valued solution for < 150-nm CD processes for implant, and a viable cost reduction for BEOL layers.”
The tight n and k optical constants of Brewer Science® ARC® DS-K101P coating provide consistent performance, while developer solubility can improve throughput by eliminating an etch step, which reduces the cost of ownership.