Gigaphoton, Inc., a major lithography light source manufacturer, announced today that its state-of-the-art GT64A ArF excimer lasers for scanners targeting 450mm wafer production are now available for order. The GT64A is the latest advancement in Gigaphoton's continuously evolving ArF platform.
The product inherits proven technologies from its predecessors such as the twin-chamber architecture, output control algorithm, beam alignment technologies, and advances them further to achieve greater output power, beam performance and stability – offering customers the industry's highest level of reliability, recovery time, and module life.
The GT64A, with its extremely high laser efficiency, can achieve power levels of up to 120W for multi-patterning in 450mm wafer production applications. Power output can be automatically adjusted to optimal levels of light energy based on the customers' process. With its highly stable energy, spectral bandwidth, and beam profile, combined with longer pulse durations, the product offers greatly improved overlay accuracy, critical dimension control, and minimization of line edge roughness – all of which are extremely important for multi-patterning lithography. Furthermore, the GT64A's product concept weighed heavily on eco-friendliness to meet customer requirements for lowering electricity, gas, and cooling equipment costs to its lowest possible level. Details of Gigaphoton's latest ArF excimer laser will be presented at the SPIE Advanced Lithography 2013, being held in San Jose, California from February 24th through the 28th.
"I am very pleased to be able to offer the GT64A – a product designed to support the highly anticipated 450mm wafer scanners", said Hitoshi Tomaru, President and CEO of Gigaphoton. "This is yet another example of our long standing commitment to contribute products that meets the detailed needs of our customers and the semiconductor industry as a whole. We are committed to continuing our investments in the research and development of advanced lithography technologies and minimizing environmental impact through our EcoPhoton™ program, and EUV light sources."