Incorporated, a leading supplier of advanced process control
metrology equipment, today announced the introduction of its latest
integrated metrology (IM) system, IMPULSE™.
Following the innovative 9000 and 9010 IM systems, the
Nanometrics IMPULSE is a 300mm, real-time metrology system used to
monitor vital CMP, CVD, etch, and photolithography process applications
for 32nm nodes and beyond. The system combines the industry’s
most advanced technology and best cost of ownership for thin film and
optical critical dimension (OCD) metrology in an IM platform.
The IMPULSE incorporates new innovations in mechano-optical
design and algorithms, allowing up to 70% higher throughput over
previous generation systems and three times tighter process control
windows. These inherent system advancements will allow device makers to
achieve better process control for greater yield and device performance.
Leveraging 35 years of R&D in metrology and over 1,000
IM systems shipped, Nanometrics continues to build on its experience to
offer innovative and reliable IM solutions to semiconductor fabs
worldwide. “Our new IMPULSE IM system will enable customers
to reach their 32nm process window targets without sacrificing process
tool productivity,” commented Steve Bradley, Director of the
Integrated Metrology Business Unit at Nanometrics. “This will
improve yield, performance, and enable a significant cost of ownership
advantage over current systems.”
The IMPULSE IM module also provides plug and play connectivity
with Nanometrics’ high-end Atlas XP standalone metrology
systems through its NanoNet connectivity solution, and along with its
compact footprint and modular design, IMPULSE enables easy
implementation for new customers and seamless upgradeability for
existing customers. When combined with Nanometrics’ NanoCD
Suite, IMPULSE enables the most advanced CD metrology in an IM system.
With the addition of the IMPULSE, Nanometrics advances its strategy and
commitment to offer comprehensive process control metrology solutions
in every segment within today’s advanced semiconductor