Precision Surface Metrology Optical Non-contact Profiler Zeta™-300

The Zeta™-300 optical surface metrology system offers multiple measurement modes with integrated vibration isolation to reduce environmental influences on surface measurements. Coupled with a built-in isolation table, the Zeta-300 delivers accuracy and repeatability unmatched by other optical profilers, and is designed to support both R&D and production environments.

Open microfluidic channel

Open microfluidic channel measured by the Zeta-300. Image credit: KLA Instruments™

Flexible Hardware & Software Options

In research, it is often unpredictable as to what type of surface will need to be measured. With this in mind, the Zeta-300 offers a modular design that allows for a wider range of hardware measurement options as well as software packages:

  • Piezo stage for 3 nm z-resolution
  • Automatic feature detect/measure software
  • Automatic surface area calculation, statistical analysis
  • Bright-field and Interferometric objectives
  • DIC/Nomarski for nanometer-scale roughness
  • Tilt stages, sample holders and vacuum chucks

User Testimonial

The diversity and speed of the KLA Instruments Zeta-300 are unmatched qualities of this system that make it indispensable in the lab. The customer service is fast and helped us even with the most unique and special requests we had, including personal software updates.

Florian Stumpf, Fraunhofer Institute IISB, Germany

Application-Specific Metrology

The Zeta-300 surface metrology tool supports multiple applications, including those listed below:

Microfluidics and MEMS analysis

  • Transparent multi-surface profiling of both open and closed channels
  • Deep trench/well & high aspect ratio feature profiling
  • Programmable cursors and cross-sections

Solar Cell and Wafer Analysis

  • Auto Finger Height, Width & Volume
  • Poly-Si and Mono-Si Surface Area & Texture
  • Silicon-Nitride AR Film Thickness
  • Multi-site and auto finger detect

LED, PSS & PEC Analysis

  • Auto Height, Diameter & Pitch for PSS
  • Analyze photoresist or post-etch PSS bumps
  • Auto feature detect, roughness for post-epi mesa analysis

Ease-of-Use Features

  • Multi-site sequencing and multi-FOV 3D image stitching with auto-stage option
  • Auto-slope and waviness compensation
  • Auto-surface leveling
  • Auto-feature height, dimensions, angle, area
  • Auto-linear and areal roughness

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