Mar 22 2007
Veeco Instruments Inc. announced today that it has received two orders for its GEN200(TM) Molecular Beam Epitaxy (MBE) System. Both of these systems will be delivered to IPG Photonics Corporation to further expand their production of high-quality GaAs-based lasers. These orders follow IPG's purchase of its first Veeco GEN200 last year.
Dr. Alex Ovtchinnikov, Vice President-Components for IPG, stated, "We are pleased with the cost of ownership advantage and initial performance of the GEN200 System which we received in 2006 from Veeco. Veeco did an excellent job delivering and installing our first GEN200, and we have also been impressed with the ongoing service and support we are receiving. We look forward to the delivery of these two additional systems."
"Repeat orders such as these from IPG attest to the adoption of Veeco's cluster-based system for production applications, as well as the continuing, comprehensive support Veeco offers," said Jeffrey Hohn, VP/General Manager, Veeco MBE Operations. He added, "We are thrilled at the opportunity to further support IPG in their capacity expansion."
The GEN200 MBE system delivers exceptional wafer quality for lab or fab applications. Its cluster tool design provides the industry's most cost effective 4x4" epiwafer growth of devices such as pump lasers, vertical cavity surface-emitting lasers (VCSELs) and heterojunction bipolar transistors (HBTs). Its cluster tool architecture minimizes clean-room space and downtime attributed to maintenance, increases throughput; and allows for growth of different materials in connected modules.