Site Sponsors
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD
  • Strem Chemicals - Nanomaterials for R&D
  • Park Systems - Manufacturer of a complete range of AFM solutions

Global Market for Nanopatterning Expects to Reach $481.48 Million by 2012

Published on June 23, 2009 at 3:21 AM

GIA announces the release of a comprehensive global report on Nanopatterning market. Though conventional optical lithography techniques are widely used for fabricating integrated circuit chips with feature sizes up to sub-100nm, their downside is the very expensive nature of the high-tech lithography systems, which has restricted their usage to industries having access to ample funds. New, unconventional nanopatterning techniques attempt to fill this void by offering low-cost, high-throughout imprinting processes.

Continued research to pattern nanometer scale features using different materials and resists has ensued the emergence and progress of hot embossing, UV-NIL, microcontact printing, and dip-pen nanolithography, among others. Still under research is nanostencil lithography, a high-resolution, shadow mask method with dynamic potential.

Among the Nanopatterning technologies, Nanoimprint Lithography (NIL) exhibits the most promising outlook. With anticipation that NIL emerges successful for commercial semiconductor manufacturing at 32nm node in the near future, the market for NIL is projected to grow the fastest between 2008 and 2015. Of the NIL techniques, UV nanoimprint lithography is projected to grow the fastest from 2008 to 2015. Another NIL technique expected to perform exceedingly well is hot embossing lithography.

The second largest nanopatterning market, Scanning Probe Lithography, would see its share decline from 2008 to 2015. Among the diverse applications, semiconductor applications and microelectronics fabrication represent the largest nanopatterning application.

The global marketplace is characterized by participants such as Ambios Technology, Inc. (USA), AMO GmbH (Germany), EV Group (Austria), Hewlett-Packard Development Company, L.P. (USA), IMS Chips (USA), International Business Machines Corp. (USA), Micro Resist Technology GmbH (Germany), Molecular Imprints, Inc. (USA), NanoInk, Inc. (USA), Nanonex Corp. (USA), NanoOpto Corp. (USA), NIL Technology (Denmark), Obducat AB (Sweden), Optomec, Inc. (USA), Sigma-Aldrich Corp. (USA), STMicroelectronics N.V. (Switzerland), SUSS MicroTec AG (Germany), Toppan Photomasks, Inc. (USA), Transfer Devices, Inc. (USA), Veeco Instruments, Inc. (USA), and Vistec Semiconductor Systems GmbH (Germany).

"Nanopatterning: A Global Strategic Business Report" announced by Global Industry Analysts, Inc. provides a comprehensive review of market trends, technologies, techniques, players, competition, research & development, recent developments, mergers, acquisitions, and other strategic industry activities. Global analysis is presented for nanopatterning technologies such as Nanoimprint Lithography (including hot embossing, UV-NIL, Microcontact Printing and others), Scanning Probe Lithography, and Other.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit