Cymer, Inc. (Nasdaq:CYMI),
the market's leading developer of light sources used to pattern advanced semiconductor
chips, announced today that its advanced XLR 600i-originally introduced as a
90 watt (W) light source-is now selectable to also operate at 60W.
This new light source, the XLR 600iX, maintains the power optics technology
developed for higher-powered applications, and is easily field-selectable to
extend from 60W to 90W. The system also provides industry-leading performance
improvements over the XLR 500i, developed for 32 nm double patterning applications
that address critical dimension (CD) control and wafer yield. Advancements include
a 1.5x improvement in wavelength and bandwidth stability, and a 2x improvement
in dose stability. Additionally, chipmakers operating the XLR 600iX at 60W will
experience improved power optics lifetimes, resulting in a lower cost of operation
compared to the XLR500i.
"The launch of the XLR 600iX reinforces our commitment to support chipmakers
with the latest technology and cost-effective solutions," said Ed Brown,
president and chief operating officer of Cymer. "As an integral part of
chipmakers' day-to-day operations, it is important to develop tools that
will meet current and future lithography applications, without requiring additional
future investment. Particularly in today's environment, extendible tools
such as the XLR 600iX are necessary to minimize costs and maximize capital investment
value."
The new XLR 600iX is available immediately, and will come equipped with Cymer's
Gas Lifetime eXtension™ (GLX) technology, which reduces light source downtime
during gas exchanges by a factor of 20, while improving CD uniformity. The platform
will also offer Cymer's OnPulse™ LaserLife Program, guaranteeing year-over-year
per pulse cost savings for the life of the light source, and stable, predictable
running costs that scale with the level of wafer production.