SEMATECH is the world's catalyst for accelerating the commercialization of technology innovations into manufacturing solutions.
By setting global direction, creating opportunities for flexible collaboration, and conducting strategic R&D, SEMATECH delivers significant return on investment to our semiconductor and emerging technology partners.
At SEMATECH, we work with our members and partners to reduce the time from innovation to manufacturing. Our role is to address critical challenges in advanced technology and manufacturing effectiveness, and to find ways to speed development, reduce costs, share risks, and increase productivity.
Semiconductor and emerging technology research is both high cost and high risk. Our membership represents about half of the world's semiconductor production, and in addition we have built a global network of alliances with equipment and material suppliers, universities, research institutes, consortia, start-up companies, and government partners. Because we all face many of the same constraints and long-term concerns, we work together to leverage resources and keep the industry vital and growing ever stronger.
Joint Patterning Center of Excellence Launched by SEMATECH and SUNY CNSE/SUNYIT
SUSS MicroTec and SEMATECH Partner to Improve EUVL Pattern Mask Cleaning Yields
SEMATECH Presents Results of Annual Mask Survey at 2013 SPIE Photomask Technology Conference
Air Products, SEMATECH Collaborate for Development of Sub-10nm Node III-V Devices
Intermolecular Joins SEMATECH’s Lithography and Front End Processes Programs
SK hynix Partners with SEMATCEH for EUVL Mask Infrastructure Development
Kumho Petrochemical Joins SEMATECH’s Resist Centre at College of Nanoscale Science and Engineering
SEMATECH EMI Partnership Members Place Orders for Carl Zeiss’ AIMS EUV Tools
SEMATECH, Inpria Partner to Tackle Key Challenges in EUV Lithography
New Partnership to Develop Ultra-Shallow Junctions for Producing Sub-14 nm Semiconductors
Sematech Announces Main Three Speakers for International Lithography Symposia 2011
Conference Highlights Integrated Bonding Tool for Mass Production
Lithography Advances by SEMATECH to be Presented at SPIE Conference
CNSE, SEMATECH and ISMI Establishes World’s First NanoHealth and Safety Center
SEMATECH's 2011 SKS Meetings Help to Enhance Global Knowledge in Nanoelectronics
New 3D Enablement Program Launched by SEMATECH, SIA and SRC
SEMATECH Engineers to Highlight Advanced Nanowire FETs at IEDM Event
International Researchers Discuss Strategies for 16 nm and Beyond Process Technologies
SEMATECH Completes 300 mm 3D IC Pilot Line Operating at CNSE Albany
Carl Zeiss and SEMATECH Achieve Key Milestone in Lithography Program
Carl Zeiss, SEMATECH Partner to Design Metrology Tool for EUV Photomasks
Lasertec Joins SEMATECH’s 3D Program at CNSE’s Albany NanoTech Complex
SEMATECH Reports Technical Advances for Semiconductor Technologies
Nanoelectronics Experts to Present at SEMICON West 2010 in California
SEMATECH Enters Collaborative Agreement with Qualcomm
SEMATECH Director to Speak on EDA Challenges at 2010 DAC
SEMATECH Reports Progressions in Wafer-to-Wafer Bonding Alignment
SEMATECH Announces New Collaboration to Address Resist Issues in EUV Lithography
Global Experts to Discuss Lithography Development at SEMATECH’s Litho Forum
JSR's Collaboration with SEMATECH Helps to Drive Nanoelectronics Innovations
SEMATECH Announces Leading Semiconductor Executives Join Speaker Lineup at Lithography Conference
Integrated Approaches to CMOS Logic and Memory Device Technology and 3D TSV Manufacturing
Chip Industry Leaders to Discuss Challenges in Advanced Lithography at Litho Forum
SEMATECH to Demonstrate Extreme Ultraviolet Lithography at SPIE Advanced Lithography 2010
Dow Electronic Materials Joins SEMATECH's Resist Materials and Development Center
Core Wafer Systems Joins SEMATECH's Front End Processes Program
SEMATECH Appoints New President and CEO
EUV and Double Patterning to Maintain Lithography Roadmap for Next Several Technology Nodes
SEMATECH Selects Okamoto's GDM300 Backgrinder for Processing Through Silicon Via
President and CEO of SEMATECH to Outline Challenges and Strategies for the Mask Industry
Collaboration Will Demonstrate New EUV Materials at Resist Materials and Development Center at CNSE's Albany NanoTech
System Enables SEMATECH To Verify Alignment Of Bonded Wafers And Through Silicon Vias
Bruker AXS Receives Order from SEMATECH
Experts to Present on Industry Trends, Technical and Manufacturing Solutions
TOK Joins SEMATECH's Resist Materials and Development Center at UAlbany NanoCollege
SEMATECH Experts to Present Significant Progress on Key Next Generation Technologies at VLSI-TSA
SEMATECH and CNSE's Albany NanoTech Working with SUSS MicroTec on Next-Generation Semiconductor Technologies
SEMATECH and Asahi Glass to Commercialize Defect Free EUV Mask Blanks
NEXX Systems Become Member of SEMATECH's 3D Interconnect Program
CNSE and SEMATECH Providing Important Community Support in Capital Region
Dr. Yitong Dong
Dr. Yitong Dong has recently been awarded funding to study custom composite nanocrystals, which could help to create advanced quantum communication technologies. Learn more about this project in this interview.
Roey Elnathan, Ph.D.
We take a closer look at the fusion of nanotechnology and CAR-T therapy through our interview with Dr. Roey Elnathan about a new approach that harnesses the capabilities of nanoneedles to efficiently deliver genetic materials to target cells.
In this interview, Laura-Isabelle, the Director of Sales at Photon etc., talks to AzoNano about how spectral imaging can help improve the next generation of solar cells.
The Verifire™ interferometer system provides fast and reliable measurements of surface form error.
Discover the compact, fast rotary table V-610 for precision testing and manufacture.
The Diamond Interaction Chamber (DIXC) is integral to the NanoGenizer high-pressure homogenizer.