Feb 16 2010
Innovative research conducted at the College of Nanoscale Science and Engineering's ("CNSE") Albany NanoTech ("ANT") Complex provides the basis for more than 40 scientific and technical papers to be presented next week at one of the world's leading conferences focused on advanced lithography.
The papers will be introduced at the SPIE Advanced Lithography conference, to be held February 21 through 25 in San Jose, CA. They cite leading-edge research performed by CNSE research teams; by global corporate partners' research teams resident at CNSE, including IBM, SEMATECH, GlobalFoundries, Tokyo Electron, Applied Materials, ASML, Vistec Lithography and the National Institute of Standards and Technology ("NIST"); and through collaborative programs involving the UAlbany NanoCollege and its corporate partners' research teams located at CNSE's ANT Complex.
Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ("EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ("e-beam") lithography, nanometrology, and nanoimprint technologies, among others.
Dr. Timothy Groves, CNSE Empire Innovation Professor of Nanoscale Science and Director of CNSE's Center for Nanolithography Development, said, "The presentation of more than 40 scientific and technical papers at the SPIE Advanced Lithography conference based on research performed at CNSE's Albany NanoTech Complex further demonstrates the success of pioneering partnerships between academia and industry in driving cutting-edge research and development. These collaborations are clearly enabling critical innovations in nanoscale lithography that will serve to meet the needs of the global nanoelectronics industry."
Dr. John Hartley, CNSE Professor of Nanoengineering and Director of CNSE's Advanced Lithography Center, said, "The groundbreaking work being done at the UAlbany NanoCollege, from researchers both at CNSE and our world-class roster of global corporate partners, is playing an important role in accelerating the use of lithography technologies for the manufacturing of advanced nanoelectronics devices. We look forward to presenting the results of that leading-edge research and are confident it will enable critical lithography solutions for the benefit of our industrial partners and the industry as a whole."
The 35th annual SPIE conference - considered the nanoelectronics lithography industry's most important technical event - is expected to attract thousands of attendees.