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Results 1 - 10 of 86 for Gas masks
  • Article - 13 Nov 2003
    Scientists at the National Taiwan University (NTU) have developed a catalyst that can be used in masks to prevent carbon monoxide poisoning due to fire. Posted November 11 2003
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    Asylum Research is the technology leader in atomic force probe microscopy (AFM) for both materials and bioscience applications.  Founded in 1999, we are dedicated to innovative instrumentation...
  • Article - 5 Apr 2004
    Researchers at the University of Pittsburgh have begun to understand why carbon nanotubes, which are shaped like a test tube and measure 1/20th of a millionth of an inch in diameter, will act as a...
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    Raith is a leading precision technology solution provider for nanofabrication, electron beam lithography, focused ion beam fabrication, nanoengineering and reverse engineering applications. Customers...
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    IS-Instruments was established in 2010 by Dr. Michael Foster and Dr. Jonathan Storey to specialise in the development of compact remote sensing instrumentation targeting industrial applications. Both...
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    INOVENSO, provide specialist laboratory and manufacturing equipment for all electrospinning needs. They provide versatile and reliable equipment for both pilot-scale and bench-scale research, which...
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    Angstrom Engineering was founded in 1992 and has quickly grown into a global company with a reputation for providing high-quality machines and unparalleled customer service. Our PVD equipment is...
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    Zurich Instruments is a test and measurement company based in Zurich, Switzerland, developing and selling measurement instruments and delivering customer support in key markets around the world,...
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    Leica Microsystems is a world leader in microscopes and scientific instruments. Founded as a family business in the nineteenth century, the company’s history was marked by unparalleled...
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    ZYGO designs, manufactures, and distributes high-end optical systems and components for metrology and end-user applications. ZYGO's metrology systems are based on optical interferometry measuring...