Renesas Technology Standardizes on Sequence Columbus-AMS For 90 Nanometer Design

Sequence Design announced global technology leader, Renesas Technology Corp., has standardized on its Columbus-AMS RLC parasitic extractor for 90 nanometer designs.

Columbus-AMS is a 3-D, RLC extractor for mixed-signal, analog, memory, and full-custom digital designs. It combines the accuracy needed for standard-cell characterization, the proven inductance modeling essential for high-performance analog design, and the capacity necessary to model full-custom designs of 1 million transistors or more. Columbus-AMS is a component of Sequence's award-winning ExtractionStage, a suite of tools that addresses both full-custom and standard-cell extraction needs.

Renesas Technology Corp., established this year as a joint venture between Hitachi, Ltd. and Mitsubishi Electric Corp., is one of the world's largest semiconductor companies, producing microcontrollers, system-on-chip devices, Smart Card ICs, mixed-signal products, flash memories, SRAMs, and more.

According to Hisaharu Miwa, Renesas department manager, EDA Technology Development Department, Design Technology Division, LSI Product Technology Unit, Columbus-AMS is currently being used for 90nm cell characterization by design teams performing library development and analog circuit design.

"Columbus-AMS is highly accurate and provides an excellent interface with our Calibre-LVS toolset," Miwa said. "When we compared Columbus with competing extraction engines, we found it to be the most precise at the transistor level and simplest to integrate with existing databases and flows. Columbus-AMS will add a great deal of value to our 'golden' 90 nanometer flow.

"We have extensive experience with Sequence's extraction technology, having used their Columbus-RF extractor for three years," Miwa added. "We trust its accuracy for modeling resistance and capacitance."

According to Dr. Susheel Chandra, Sequence senior vice president of R&D and product marketing, Columbus-AMS was built with easy integration into industry-standard design flows in mind, such as the Mentor Calibre flow, making user adoption a fast and painless process.

Posted 12th November 2003

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