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Vapor Technologies Unveils Pure Black Low Temperature Arc Vapor Deposition Coating

Vapor Technologies, a provider of physical vapor deposition thin-film coating devices, has introduced a first-of-its-kind true black sophisticated low temperature arc vapor deposition (LTAVD) coating.

8 Dec 2011

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

USHIO has expanded its modular full-field projection lithography tool line called the UX4 Series with the launch of three new models, the UX4-ECO FFPL 150, the UX4-MEMS FFPL 200 and the UX4-3Di FFPL 300, for producing power devices, MEMS devices and three-dimensional LSI devices, respectively.

7 Dec 2011

Gigaphoton Supplies 1,000th Excimer Laser for Semiconductor Photolithography

Gigaphoton, a provider of lithography light sources, has announced the delivery of its 1,000th excimer laser for photolithography applications in semiconductor fabrication.

7 Dec 2011

Applied Materials Introduces CVD System for TSVs in Three-Dimensional Chip Packaging

Applied Materials, a provider of equipment, software and services for manufacturing advanced flat panel display, solar photovoltaic and semiconductor products, has introduced an innovative new technology for producing backside-illuminated (BSI) image sensors that are utilized in the latest, sophisticated tablet PCs, smartphones and cameras.

From Applied Materials Inc. 7 Dec 2011

Researchers Use Microfabrication Techniques to Facilitate MEMS and NEMS Device Production

A research team led by Professor Chang-Beom Eom at the University of Wisconsin-Madison has found a way to create a low-voltage near-nanoscale electromechanical device by integrating a complex, single-crystal, piezoelectric material called lead magnesium niobate-lead titanate (PMN-PT) having ‘giant’ piezoelectric properties with silicon.

19 Nov 2011

Researchers Develop Efficient Upconversion Process in Nanoparticles

Researchers at the National University of Singapore (NUS) in partnership with scientists at the Fujian Institute of Research on the Structure of Matter and the King Abdullah University of Science and Technology have developed an efficient upconversion technique in nanoparticles, paving the way to efficiently control light emission utilized in imaging applications.

16 Nov 2011

Researchers Work on Plasma Etching Technology Improvement to Fabricate Nanoelectronics

Nowadays, plasma etching technology has been widely used for the production of semiconductor devices at the nano-scale down to 20 nm. Lam Research technologists are now working on the advancement of plasma etching technology to produce even smaller, quicker and tightly packed multipurpose chips.

15 Nov 2011

Researchers Study Role of Temperature in Controlling in Dip-Pen Nanolithography

Scientists at the Lawrence Berkeley National Laboratory (Berkeley Lab) of the U.S. Department of Energy (DOE) have studied the function of temperature in manipulating a nanofabrication technique known as dip-pen nanolithography for writing chemical patterns down to 20 nm.

9 Nov 2011

Nanometrics Launch Optical Critical Dimension Metrology System for Semiconductors

Nanometrics Incorporated (NASDAQ: NANO), a leading supplier of advanced metrology systems, today introduced the Atlas II optical critical dimension (OCD) system, a next-generation tool for high-performance process contro...

8 Nov 2011

Silex-AMFitzgerald Partnership Enables Rapid Commercialization of MEMS Designs

A multi-year collaboration has led to a reduction in the development time for MEMS devices by 50%. Silex Microsystems, a pure-play MEMS foundry, and AMFitzgerald, a provider of solutions for MEMS product development have partnered in the collaboration.

From Silex MicroSystems 5 Nov 2011

Nanofabrication News

Vapor Technologies Unveils Pure Black Low Temperature Arc Vapor Deposition Coating

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

Gigaphoton Supplies 1,000th Excimer Laser for Semiconductor Photolithography

Applied Materials Introduces CVD System for TSVs in Three-Dimensional Chip Packaging

Researchers Use Microfabrication Techniques to Facilitate MEMS and NEMS Device Production

Researchers Develop Efficient Upconversion Process in Nanoparticles

Researchers Work on Plasma Etching Technology Improvement to Fabricate Nanoelectronics

Researchers Study Role of Temperature in Controlling in Dip-Pen Nanolithography

Nanometrics Launch Optical Critical Dimension Metrology System for Semiconductors

Silex-AMFitzgerald Partnership Enables Rapid Commercialization of MEMS Designs

Research Boosts Graphene’s Potential to Unprecedented Heights

New Study Finds Electrons Flow Like Liquid in Graphene, Breaking Rules

Novel 3D Imaging Technique Captures In Situ Nanoparticle Self-Assembly

Nanoparticles That Boost Tomato Plant Growth

Orange Peel Nanoparticles: New Green Synthesis

Enhancing Slurry Stability in Lithium-Ion Batteries with Turbiscan Technology

PiFM and its Role in Nanoscale Chemical Imaging

Conversations on AFM: How AI is Automating Scanning Probe Microscopy

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Comparing Spectroscopic Techniques for Nanoscale Analysis of Polyethylene Formation

How Photothermal AFM-IR Enables Nanoscale Defect Detection in Semiconductors

Overcoming the Limits of Traditional DLS in Lipid-Based Nanoparticle Manufacturing

Next-Generation Biological Imaging Using Raman-SEM