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Cadence and imec Complete First Tapeout of 5nm Test Chip using EUV and 193i Lithography

Cadence and imec Complete First Tapeout of 5nm Test Chip using EUV and 193i Lithography

Nanophase Awarded U.S. Patent for C3 Metal Oxide Surface Treatment Technology

Nanophase Awarded U.S. Patent for C3 Metal Oxide Surface Treatment Technology

Collaboration to Develop Fluorescence Immunoassays Based on Metal Enhanced Fluorescence

Collaboration to Develop Fluorescence Immunoassays Based on Metal Enhanced Fluorescence

Practical Method to Create Nano-Electronic Devices One Atomic Layer at a Time

Practical Method to Create Nano-Electronic Devices One Atomic Layer at a Time

Fabricating Devices Directly on Silicon with Magnetic Tunnel Junctions Could Minimize Problem of Overheating

Fabricating Devices Directly on Silicon with Magnetic Tunnel Junctions Could Minimize Problem of Overheating

New Method to Produce Inexpensive, High-Performing Epidermal Wearable Health Monitoring Patches

New Method to Produce Inexpensive, High-Performing Epidermal Wearable Health Monitoring Patches

Perception Survey Reveals Increased Optimism in Implementation of EUV Lithography for Semiconductor HVM

Perception Survey Reveals Increased Optimism in Implementation of EUV Lithography for Semiconductor HVM

Light-Activated Molecular Motors Rotate Unidirectionally at High Speed

Nanocrystal Ink Deposition Enables Progress Towards DIY Spray-on Solar Cells

Nanocrystal Ink Deposition Enables Progress Towards DIY Spray-on Solar Cells

TSMC Honors Synopsys with Partner of the Year Award

TSMC Honors Synopsys with Partner of the Year Award

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