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NSF Awards Grant for Study of Complex Physical and Chemical Reactions in Lithography Systems

NSF Awards Grant for Study of Complex Physical and Chemical Reactions in Lithography Systems

Speakers Announced for Oxford Instruments Seminar at IOP in Beijing

Speakers Announced for Oxford Instruments Seminar at IOP in Beijing

Print Performance Studies Compare Electroform and Laser-Cut Stencils

Print Performance Studies Compare Electroform and Laser-Cut Stencils

High-Tech Embossing Used to Produce Finer Results in Forming Silver Nanostructures

High-Tech Embossing Used to Produce Finer Results in Forming Silver Nanostructures

ElectroniqueS Magazine Honors Xilinx Virtex UltraScale Device with 2014 Electron d'Or Award

ElectroniqueS Magazine Honors Xilinx Virtex UltraScale Device with 2014 Electron d'Or Award

SEMICON West: QuantumClean to Present on ‘Importance of Precision Parts Cleaning for Sub-20nm Technology Nodes’

SEMICON West: QuantumClean to Present on ‘Importance of Precision Parts Cleaning for Sub-20nm Technology Nodes’

New Report on Materials, Processes & Tools for Roll-to-Roll Fabrication of Flexible Devices & Electronics

New Report on Materials, Processes & Tools for Roll-to-Roll Fabrication of Flexible Devices & Electronics

ORNL Nano-Enabled Synthetic Biology Researcher Named Corporate Fellow

ORNL Nano-Enabled Synthetic Biology Researcher Named Corporate Fellow

Synopsys Offers DesignWare IP for TSMC's 28-nm High-Performance Compact Process

Synopsys Offers DesignWare IP for TSMC's 28-nm High-Performance Compact Process

ZEISS Introduces Next Generation of Photomask Qualification System, AIMS 1x-193i

ZEISS Introduces Next Generation of Photomask Qualification System, AIMS 1x-193i

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