Dec 2 2009
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced a follow-on order for ten of its Atlas® XP metrology systems, as well as industry-leading NanoDiffract™ software, from a leading memory customer. These systems are incremental to systems previously ordered and announced earlier this year. The systems are to be delivered to multiple factories throughout the fourth quarter of 2009 and first quarter of 2010 in support of technology re-tooling for next-generation DRAM and Flash manufacturing.
“We are pleased to announce the selection and continued commitment to Nanometrics’ Atlas XP systems for the upcoming manufacturing ramp. By combining the advanced optical critical dimension (OCD) performance of our NanoDiffract software with the thin film metrology capability afforded in every Atlas system, we enable performance and cost of ownership advantages that we believe are superior to other thin film and OCD solutions on the market,” commented Michael Fischer, Vice President of Worldwide Sales at Nanometrics. “Our applications team is working closely with our customers to meet critical process control challenges by extending the role of our metrology solutions to improve advanced technology node yields, while simultaneously reducing the overall cost of fab metrology.”
Nanometrics’ NanoCD™ suite of technologies, which includes the Atlas OCD system, NanoGen™ scalable cluster computing hardware and NanoDiffract software, has become an industry-leading solution for advanced in-device metrology and process control on complex structures. Nanometrics’ Atlas systems enable complex structure and process control non-destructively and can be deployed at all key process steps in line for film thickness, profile and critical dimension control.