Nano-Hole Arrays Now Available from Eulitha

Researchers in need of nano-structures for replication processes such as nano-imprint lithography are often discouraged by the high cost of obtaining masters or templates. Eulitha has now added nano-hole arrays to its standard product line to make high-quality 2D patterns affordable.

The patterns, chosen because of frequent customer inquiries consist of holes on rectangular grids. These patterns etched in Si substrates are suitable for use as nano-imprint stamps or for direct deposition experiments. Two patterns are now on offer (a) a 45 nm / 50 nm half-pitch array and (b) a 35 nm / 37.5 nm half-pitch array. The two dimensions denote the half-pitch along the two orthogonal directions of the rectangular grid. You can click here for more information including current prices.

EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders have played critical roles in the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring needs of targeted applications through this breakthrough technology. At present, it provides products as samples for nanotechnology R&D.

Source: Eulitha


Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Eulitha AG. (2019, February 14). Nano-Hole Arrays Now Available from Eulitha. AZoNano. Retrieved on August 12, 2020 from

  • MLA

    Eulitha AG. "Nano-Hole Arrays Now Available from Eulitha". AZoNano. 12 August 2020. <>.

  • Chicago

    Eulitha AG. "Nano-Hole Arrays Now Available from Eulitha". AZoNano. (accessed August 12, 2020).

  • Harvard

    Eulitha AG. 2019. Nano-Hole Arrays Now Available from Eulitha. AZoNano, viewed 12 August 2020,

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback