Mattson Technology Releases paradigmE Si for Silicon Etch Applications

Mattson Technology has released the paradigmE Si into the market, which is useful for semi-crucial silicon etch applications.

The innovative silicon etch system strengthens the novel standards set by the company’s paradigmE, which allows clients to satisfy strict processing needs for manufacturing devices at advanced technology nodes. Several paradigmE Si systems are already being produced.

Developed on the architecture of the paradigmE, paradigmE Si has been improvised to allow clients to impact the chemistries needed for poly-silicon applications. The system incorporates the company’s proprietary Faraday shield to enhance mean-time-between-clean (MTBC) performance and to enhance control of the etch process. The paradigmE Si also helps to achieve autonomous control of energy and ion density, thus offering reduced sputtering and enhanced profile control to achieve low maintenance costs for the owners. According to a market forecast report released by Gartner Dataquest, the silicon etch market size is anticipated to grow from $1.937 billion in 2010 to $1.957 billion in 2011.

The VP and general manager at Plasma Products Group of Mattson Technology, Rene George, stated that the paradigmE Si is specifically designed to suit semi-critical multiple etch applications by rendering around 30% cost-of ownership benefits and high process performance.

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