Ghent University has been creating its particle and powder coating technologies for surface functionalization application.
Ghent University’s Professor, Christophe Detavernier said that the growing number of potential applications for nanocoatings on particles and powders that need atomic level control of layer thickness and uniformity has been rising over the last 10 years. ALD has been demonstrated to have a very reliable means of depositing ultrathin, conformal coatings on powders.
Furthermore, the system’s rotary reactor’s architecture was specially designed to provide optimal conformal coatings, without involving the intricate traditional fluidized approaches.
This collaboration was pronounced at the 12th International Conference on Atomic Layer Deposition (ALD 2012) held in Dresden, Germany, last week.
The research titled ‘A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects’ was presented by the University of Ghent. Furthermore, the scientists at Cambridge NanoTech presented their work on Self Assembled Monolayers, spatial ALD, In-situ QCM and spectroscopic ellipsometry.
The declaration came after the recognition of Cambridge NanoTech as the Boston Business Journals Pacesetters list for the fourth successive year. Cambridge NanoTech ranked 5th out of 73 of the fastest-growing companies in the area, having 202.61% revenue growth over three years from 2008 to 2011. Cambridge NanoTech ranked 28 in the Top 50 Fastest-Growing Women-Owned/Led Companies list by the Women Presidents' Organization, in collaboration with OPEN, American Express.
Source: http://www.ugent.be/
Disclaimer: The views expressed here are those of the author expressed in their private capacity and do not necessarily represent the views of AZoM.com Limited T/A AZoNetwork the owner and operator of this website. This disclaimer forms part of the Terms and conditions of use of this website.