SENTECH Instruments is a leading supplier of plasma process technology equipment for etching and deposition and thin film metrology instruments based on ellipsometry.
The communication with our customers and users is a very important aspect of the service activities of SENTECH Instruments. As we are supplying and developing high quality metrology equipment like our spectroscopic ellipsometers we are always aimed to reach highest satisfaction of our customers. Therefore we keep in touch with our users by attending events like the Ellipsometer Workshop 2014 in Dresden.
SENTECH's booth at the Ellipsometer Workshop 2014
This Workshop took place in March at the Leibniz Institute of Polymer Research. Scientists and engineers from the metrology society discussed recent developments in science, technology and application for Ellipsometry. The main focus of this workshop was on experiments using Müller Matrix analysis. For this field of study SENTECH provides a smart option for the SENresearch tools for detecting all 16 different Müller-Matrix-Elements.
SENTECH not only took part in these discussions but also contributed two posters which were specified on recent developments of ellipsometric applications at SENTECH. On the first poster the application of in situ monitoring for plasma processing, especially atomic layer deposition ALD, was presented. With SENTECH inline metrology tools layer by layer growth can be resolved with single cycle resolution. Hence ALD deposition can be analysed and optimized on a cycle basis with SENTECH spectroscopic and laser ellipsometers. In the second poster the analysis of graphene flakes was shown. Counting and mapping graphene monolayers is enabled by SENTECH thin film measurement tools.
We are proud of receiving very positive feedback concerning the performance of our metrology devices. The enthusiasm of our customers empowers us to maintain our broad customer service as well as to enlarge those activities to always meet the requirements and needs of all users of SENTECH metrology equipment.