Article - 7 May 2004
Sequoia Pacific Research Company (Sequoia Pacific) today announced its SoilSET has been named one of three finalists for the 2004 Utah Innovation Awards in the chemicals, pharmaceuticals and...
News - 7 Jul 2009
Nova Measuring Instruments Ltd. (NASDAQ: NVMI) provider of leading edge stand-alone metrology and the market leader of integrated metrology solutions to the semiconductor process control market today...
News - 31 Jan 2008
Nanometrics Incorporated, a leading supplier of advanced metrology equipment to the semiconductor industry, today introduced NanoCD Suite. This new product suite is composed of four key optical...
Park Systems developed the world’s first commercial AFM in 1989, opening up a new world of research and development.
Park Systems provides original and innovative AFM solutions for the most...
Park's Smart ADR provides fully automated defect review and identification, enabling a critical in-line process for classifying defect types and sourcing their origin using high resolution 3D imaging....
Article - 29 Jun 2016
The atomic force microscope (AFM) is a crucial tool to analyze single-asperity contacts and their structural and tribological characteristics, such as topography, wear, adhesion, and friction.
Article - 26 Nov 2010
The cryogenic process has also found a growing market in the etching of Nanostructures. Both the Bosch process and Cryo process will find use in the growing field of integrated sensors and actuators,...
News - 1 Feb 2013
The research of a multi-institutional team from the U.S., Japan, and France, led by Predrag S. Krstic of the Joint Institute for Computational Sciences and Jean Paul Allain of Purdue University has...
News - 11 Jul 2012
Today at SEMICON West 2012, Bruker announced three new 450mm X-Ray and AFM semiconductor metrology products to support the industry's transition to larger wafer production. These new products...
News - 24 Nov 2009
Novellus Systems (NASDAQ:NVLS) has developed a suite of ashable hardmask (AHM) films that have up to 25 percent greater etch selectivity compared to similar amorphous carbon films in use by the...