TERA-print

At TERA-print we commercialize desktop nanofabrication tools and technologies that allow researchers of varying backgrounds to nanofabricate like never before. The TERA-Fab E Series is a versatile photolithography technology capable of traversing the nano-, micro- and macroscale in real-time, while also featuring a digital photomask platform (no physical masking required) and broad compatibility with both soft and hard materials. TERA-Fab technologies are already advancing users’ research in key fields, including microfluidics, bio- and electrochemical sensing, microarray patterning, and device prototyping.

Enabling Technology | Beam Pen Lithography

Beam pen lithography (BPL) is a cantilever-free scanning probe lithography technique invented by Dr. Chad Mirkin at Northwestern University. This approach combines an advanced UV projection system with a proprietary BPL array to allow up to 100,000 independently addressable probes to conduct mask-free photolithography. The BPL array ultimately controls the attainable feature size, which can range from sub-250 nm up to 1 µm. The TERA-Fab can also be used in a maskless projection mode (no BPL array) for applications that require feature resolutions > 1.5 µm, such as microfluidic molds or MEMs devices.