EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and JOANNEUM RESEARCH (JR), a leading international research organization based in Graz, Austria, today announced that they are collaborating on a joint-solution for research and development activities in large-area nanoimprinting leveraging the EVG®770 automated UV-nanoimprint lithography (NIL) step-and-repeat system.
Toppan Printing Co., Ltd. (hereafter Toppan Printing; head office: Chiyoda Ward, Tokyo; President & Representative Director: Shingo Kaneko) has developed a next-generation EUV photomask for leading-edge semiconductors.
The 2D materials workshop, on Thursday April 7th 2016, is going to take place at the National Graphene Institute (NGI) of Manchester University.
Researchers at the Technion-Israel Institute of Technology have developed technology to compress light wavelengths fourfold, providing a way to focus light beyond normal wavelengths to reach nanoscales (a nanometer is a billionth of a meter) in length.
Rudolph Technologies, Inc. announced today that a leading outsourced assembly and test facility (OSAT) has placed an order for the JetStep® Lithography System for the semiconductor advanced packaging industry’s first panel manufacturing line.
Research and Markets has announced the addition of the "Nanopatterning - Global Strategic Business Report" report to their offering.
Ultratech, Inc., a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HBLEDs), as well as atomic layer deposition (ALD) systems, today announced that it has received a large multiple-system order from a leading semiconductor manufacturer for its advanced packaging AP300 lithography systems.
The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its fourth annual eBeam Initiative members' perceptions survey. A record 64 industry luminaries representing 35 different companies from across the semiconductor ecosystem—including chip design, equipment, materials and manufacturing as well as photomasks—participated in this year's survey.
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, has received an order for multiple SUSS MicroTec Photonic Systems lithography tools in Q3 2015 from a leading semiconductor manufacturer. The strategically important order includes multiple DSC300 Gen2 projection scanners, which are produced at the company’s facility in Corona, USA. The order volume is in the high single-digit million Euro range.
The National Science Foundation has selected the Cornell NanoScale Science and Technology Facility (CNF) to be part of the newly established National Nanotechnology Coordinated Infrastructure (NNCI). Cornell will receive $8 million from the federal agency over five years.