A versatile method to pattern the structure of nanowires has been developed by a team of Hokkaido University researchers. This new method provides a tool that will aid the development of novel nanodevices.
Manufacturers of computer chips constantly aim to pack more transistors into less space, however with the size of those transistors nearing the atomic scale, there are physical limitations on how small they are able to make the circuitry’s patterns.
Nanotechnology is widely considered to be the way of the future for electronics, medicine and many other scientific endeavours.
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, announced the launch of the MA/BA Gen4 series today.
The George Washington University (GW) recently received multiple instruments from the Raith product portfolio to serve its interdisciplinary nanoscale research community at the new Science & Engineering Hall, and important results have already been achieved.
An innovative nano-lithography printing system has been installed at the University of Bath, making it the only institution in the United Kingdom that has this novel nano-scale patterning equipment. This capability enables the university to play a pioneering role in the advancement of next-generation manufacturing methods for nano-engineered semiconductors.
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and JOANNEUM RESEARCH (JR), a leading international research organization based in Graz, Austria, today announced that they are collaborating on a joint-solution for research and development activities in large-area nanoimprinting leveraging the EVG®770 automated UV-nanoimprint lithography (NIL) step-and-repeat system.
Toppan Printing Co., Ltd. (hereafter Toppan Printing; head office: Chiyoda Ward, Tokyo; President & Representative Director: Shingo Kaneko) has developed a next-generation EUV photomask for leading-edge semiconductors.
The 2D materials workshop, on Thursday April 7th 2016, is going to take place at the National Graphene Institute (NGI) of Manchester University.
Researchers at the Technion-Israel Institute of Technology have developed technology to compress light wavelengths fourfold, providing a way to focus light beyond normal wavelengths to reach nanoscales (a nanometer is a billionth of a meter) in length.