Nanofabrication News

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IMS Nanofabrication Commences New Partnership for eMET Technology

IMS Nanofabrication has declared that the company together with Photronics, Intel and Dai Nippon Printing is launching a joint electron multi-beam mask writer tool partnership to further develop the electron multi-beam projection technology of the company.

From IMS Nanofabrication GmbH 25 Jan 2012

Nano Med Tech’s Chemical Process Helps Advance Medical Applications

Scientists from Nano Med Tech have developed a modified chemical method to create complex shapes, including honeycomb-like multi-chambered shapes and three dimensional boxes by hollowing nanoparticles.

20 Jan 2012

Novel Microtweezers Help Develop MEMS Devices

Scientists from Purdue University have developed novel microtweezers that can be used to manipulate objects to construct small structures such as MEMS, apply coatings to create sophisticated sensors and collect and locate live stem cell spheres onto analytical sensors and devices for research.

19 Jan 2012

WNLO to get Electron Beam Lithography Capabilities Thanks to Vistec

Vistec Lithography, B.V. is pleased to announce today that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST) in Wuhan, P.R. of China signed off its electron-beam lithography system Vistec EBPG5000pES.

16 Jan 2012

Forming Perfectly Spherical Nanoparticles Using Plasmonic Hotspots

KU Leuven researcher Ventsislav Valev and an international team of scientists have developed a new method for optical manipulation of matter at the nanoscale. Using 'plasmonic hotspots' - regions with electric current...

15 Jan 2012

Fabrication of Atomic-Scale Silicon Wires Helps Realize Future Quantum Computers

Scientists from the Purdue University, Melbourne University and University of New South Wales have fabricated the smallest silicon-based wire in the world, with a current-conducting capability equivalent to that of copper wires. The silicon wire has four-atom width and one-atom height.

7 Jan 2012

Tegal Completes Nanolayer Deposition Patent Portfolio Sale

Tegal has declared that it has issued patents of its nanolayer deposition (NLD) patent portfolio for three bid lots to several bidders. The total number of bid lots offered for sale is four, which is valued at roughly $4 million. So far, the company has received roughly $3.6 million.

From Collabrx, Inc. 2 Jan 2012

Novel Wet-Etching Process for Producing High-Aspect-Ratio III-V Nanostructures

A research team led by Xiuling Li, who serves as a Professor of electrical and computer engineering at the University of Illinois at Urbana-Champaign, has developed a low-cost method to fabricate high-aspect-ratio, large-area III-V nanostructures for applications in advanced optoelectronic devices such as lasers and solar cells.

From University of Illinois at Urbana-Champaign 26 Dec 2011

New Partnership to Develop Ultra-Shallow Junctions for Producing Sub-14 nm Semiconductors

SEMATECH has inked a partnership deal with Dainippon Screen Mfg. to develop and commercialize sophisticated semiconductor doping technology for the sub-14 nm semiconductor production.

21 Dec 2011

Arradiance Signs Partnerships to Market GEMStar ALD Systems in Japan, Asia and Europe

Arradiance, a provider of functional film technologies and thin film process systems, has declared that Euris Semiconductor Services based in Grenoble, France has signed a partnership deal to sell and support Arradiance’s GEMStar benchtop atomic layer deposition (ALD) tools in Europe.

From Arradiance 17 Dec 2011