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PROFACTOR Group to Co-Ordinate Austrian Nanoimprint Lithography Project for Another 3 Years

The PROFACTOR Group, the number 1 in applied production research in Austria, has received approval to coordinate the NILaustria project cluster for a further three years. This approval came recently from the Austrian Res...

3 Oct 2011

Researchers Use Cobalt Nanostructures to Create Magnetic Materials

Research teams at the University of Massachusetts have developed an easy way to create magnetic materials at room temperatures from nanostructures.

From University of Massachusetts Amherst 29 Sep 2011

Researchers Use Gold Nanowires to Create Cardiac Patches

A research team comprising of scientists, doctors and engineers from the Children’s Hospital Boston at the Massachusetts Institute of Technology have developed cardiac patches made from very small gold wires.

From Massachusetts Institute of Technology 27 Sep 2011

Major Korean Memory Manufacturer Selects Nanometrics CMP Control System

Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced metrology systems, today announced that its IMPULSE integrated metrology optical critical dimension (OCD) and film analysis system has been selected...

26 Sep 2011

Samsung’s Line-16 Memory Fabrication Facility Begins Operations

Samsung Electronics has commenced operations at its 198,000 sq.m Line-16 Memory Semiconductor fabrication facility. Construction of the facility was started during May 2010 and installations were completed by May 2011.

From Samsung Electronics 26 Sep 2011

D2S Introduces Mask-Wafer Double Simulation Workstation for 20-nm-Node and Below Designs

D2S has unveiled first-of-a-kind mask-wafer double simulation accelerated workstation called TrueMask DS for hot-spot analysis, bit-cell design, research and development exploration and mask-defect classification that understands dose modulation and overlapping eBeam shots.

23 Sep 2011

Physical and Chemical Vapor Deposition Equipment Market to Experience Drastic Growth

Companiesandmarkets.com has released a new report titled “Thin Layer Deposition Equipment: A Global Strategic Business Report”. The report explains the challenges, trends, growth drivers, market barriers, M&A activities and other influencing factors.

21 Sep 2011

CEA-Leti Includes Synopsys in IMAGINE Program on Maskless Lithography

CEA-Leti has announced the inclusion of Synopsys as an industrial partner in the IMAGINE program designed for the development of maskless lithography for the production of integrated circuits (ICs).

From CEA-Leti 21 Sep 2011

New EUV Advanced Reticle Etch System Overcomes Hurdles Associated with EUV Lithography

Applied Materials, Inc. today advanced the state-of-the art in photomask technology with its new Applied Centura TetraTM EUV Advanced Reticle Etch system. Overcoming a major hurdle to the adoption of EUV lithography, ...

From Applied Materials Inc. 19 Sep 2011

Utilization of Water Vapor in Place of Ozone Increases Growth Rate of ALD Films

Steam purification company RASIRC has declared that it has presented a poster on the benefits of water vapor utilization over ozone in the atomic layer deposition (ALD) process at the 26th European Photovoltaic Solar Energy Conference and Exhibition conducted in Hamburg, Germany, from September 5 to 9, 2011.

17 Sep 2011