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Applied Materials Introduces Baccini Esatto Technology

Applied Materials, Inc. today announced its Baccini Esatto Technology™, a high precision, multi-step screen printing capability for Applied's market-leading Baccini back-end solar cell processing systems.

From Applied Materials Inc. 17 Sep 2009

How to Consistently Create Hollow, Solid and Amorphous Nanoparticles of Nickel Phosphide

Tiny objects known as nanoparticles are often heralded as holding great potential for future applications in electronics, medicine and other areas. The properties of nanoparticles depend on their size and structure. ...

16 Sep 2009

Engineers Invent New Technology to Deposit Nanostructured Films on Various Surfaces

Chemical engineers at Oregon State University have invented a new technology to deposit "nanostructure films" on various surfaces, which may first find use as coatings for eyeglasses that cost less and work better.

16 Sep 2009

Study Helps Overcome a Long-Standing Challenge in Nanotechnology

College football fans cheer when marching bands spell out the home team's name in gigantic letters on the field at halftime. Now scientists in Utah are reporting the ultimate in one-upmanship: Development of a new technology for writing the school name in letters so small that 500 would fit across the diameter of a human hair (or hundreds of thousands would fit inside the diameter of a human hair).

16 Sep 2009

Delivery of First Optical System from Carl Zeiss Joins List of Positive News About EUV Lithography

Carl Zeiss, the world's leading manufacturer of optical systems for chip fabrication, has now delivered a complete optical system for production-ready Extreme Ultraviolet Lithography (EUVL), a new technology for microchip fabrication.

From Carl Zeiss Microscopy GmbH 16 Sep 2009

Optomec Showcases Aerosol Jet Printing System at European Conference

Optomec announced today that they will showcase their patented Aerosol Jet Printing System for higher efficiency solar cells at the 24th European Photovoltaic Solar Energy Conference and Exhibition (PVSEC) in Hamburg, Germany on September 21st- 24th.

From Optomec 15 Sep 2009

Nanoscale Friction and Manipulation of Carbon Nanotubes

Nanotubes and nanowires are promising building blocks for future integrated nanoelectronic and photonic circuits, nanosensors, interconnects and electro-mechanical nanodevices. But some fundamental issues remain to be resolved - among them, how to position and manipulate the tiny tubes.

15 Sep 2009

Nemotek Technologie Successfully Completes Extreme Temperature Testing for Wafer-Level Packaging Solution

Nemotek Technologie, a manufacturer of customized Wafer-Level Cameras for portable applications, today announced that it has successfully completed extreme temperature testing for its Wafer-Level Packaging (WLP) solution...

15 Sep 2009

AIXTRON Receives Order for MOCVD tool from Nanjing University

AIXTRON AG announced today an order for a new MOCVD tool from Nanjing University's Institute of Optoelectronics (IOE) at Yangzhou. The order is a single AIX 2400G3 HT MOCVD system for development of ultra-high-brightness (UHB) InGaN/GaN-based LEDs and has been delivered in the first half of 2009.

From AIXTRON SE 15 Sep 2009

Carl Zeiss Introduces Next Generation AIMS Mask Qualification System

At the Photomask Technology Conference 2009 in Monterey/CA Carl Zeiss introduces the next generation of their actinic AIMS™ mask qualification system. AIMS™ 32-193i emulates the imaging of photomasks with leading-edge 193nm immersion scanners for the 32nm node and beyond. The first delivery to a leading edge customer is scheduled for September 2009.

From Carl Zeiss Microscopy GmbH 14 Sep 2009