Nanoelectronics News

RSS

Flying Start for New Company with Initial Multimillion-Dollar Deal to Key Semiconductor Fab

Global Litho Services (GLS) is pleased to announce its establishment today, providing services and pre-owned lithography equipment to the mature semiconductor, MEMS, and niche application markets. Registered in the Ne...

14 Jul 2009

IMEC Presents Innovations in Dielectrics and Metallization Technologies as well as in Their Integration Approaches

IMEC presents innovations in dielectrics and metallization technologies as well as in their integration approaches. Great progress has been obtained in the metallization of 22nm interconnects, in Cu/low-k reliability assessment and in the suppression of low-k integration damage.

From IMEC 14 Jul 2009

Project Aimed at Setting up National Production of 90-nm Topology Very Large Scale Integrated Circuits

RUSNANO Supervisory Council approved the Corporation's participation in the project aimed at setting up national production of 90-nm topology very large scale integrated circuits (VLSI). In the range of products manu...

14 Jul 2009

IMEC Extends its EUV Lithography Research Program

IMEC today announced that it is extending its EUV (extreme ultra-violet) lithography research program with a parallel dedicated EUV mask cleaning research program. The program will build on a new collaboration between IM...

From IMEC 14 Jul 2009

IMEC Launches New Program Focusing on Development of GaN Technology

IMEC today announces the launch of a new industrial affiliation program (IIAP) that will focus on the development of GaN technology for both power conversion and solid state lighting applications.

From IMEC 14 Jul 2009

IMEC Establishes New Partnerships with Solar Cell Material and Equipment Suppliers

IMEC today announced that it has established new partnerships with solar cell material and equipment suppliers. These companies, including MEMC Electronic Materials Inc., Leybold Optics Dresden GmbH, Roth + Rau AG, and Mallinckrodt Baker B.V., have concluded joint-development agreements with IMEC in the frame of IMEC's newly launched wafer-based silicon photovoltaics industrial affiliation program (IIAP).

From IMEC 14 Jul 2009

IMEC Achieved Promising Results in the Race to Scale CMOS to 22nm and Below

IMEC has achieved promising results in the race to scale CMOS to 22nm and below. The breakthroughs from its transistor scaling programs include a successful integration of the laser-anneal technique in a high-K/metal-gate first process and a step forward towards fabricating aggressively scaled germanium-pFET transistors.

From IMEC 14 Jul 2009

Nanoelectronics News

Flying Start for New Company with Initial Multimillion-Dollar Deal to Key Semiconductor Fab

IMEC Presents Innovations in Dielectrics and Metallization Technologies as well as in Their Integration Approaches

Project Aimed at Setting up National Production of 90-nm Topology Very Large Scale Integrated Circuits

IMEC Extends its EUV Lithography Research Program

IMEC Launches New Program Focusing on Development of GaN Technology

IMEC Establishes New Partnerships with Solar Cell Material and Equipment Suppliers

IMEC Achieved Promising Results in the Race to Scale CMOS to 22nm and Below

ESI Bolster its Technology Offerings for 3D IC Packaging and Memory Repair Product Applications

American Nano Silicon Tech Signs Cooperative R+D Agreement with University

SUSS MicroTec and IMEC to Develop Bonding Technology for 3D System Integration

Research Boosts Graphene’s Potential to Unprecedented Heights

New Study Finds Electrons Flow Like Liquid in Graphene, Breaking Rules

Novel 3D Imaging Technique Captures In Situ Nanoparticle Self-Assembly

Nanoparticles That Boost Tomato Plant Growth

Orange Peel Nanoparticles: New Green Synthesis

Enhancing Slurry Stability in Lithium-Ion Batteries with Turbiscan Technology

PiFM and its Role in Nanoscale Chemical Imaging

Conversations on AFM: How AI is Automating Scanning Probe Microscopy

Sponsored Content

Comparing Spectroscopic Techniques for Nanoscale Analysis of Polyethylene Formation

How Photothermal AFM-IR Enables Nanoscale Defect Detection in Semiconductors

Overcoming the Limits of Traditional DLS in Lipid-Based Nanoparticle Manufacturing

Next-Generation Biological Imaging Using Raman-SEM