Brion and Cymer Announces Collaboration to Improve Computational Lithography Modeling

Brion, a division of ASML, and Cymer Inc. (Nasdaq:CYMI) today announced the successful incorporation of detailed Cymer laser spectral characteristics into Brion's computational lithography models. Initial results show improvement in a significant portion of the model accuracy budget. This is the first time that this level of laser bandwidth characterization has been integrated into computational lithography products. The improved modeling will enable semiconductor manufacturers to produce more advanced chips.

The work utilizes Cymer's factory-measured data, and underscores the importance of laser bandwidth stabilization technology and tuning. The modeling improvements to Brion's OPC RET series of products benefit customers by increasing modeling accuracy. Brion's new LithoTuner series of products for the fab are also enhanced with additional tuning flexibility.

"ASML and Cymer have a long history of successful partnerships," said Ed Brown, president and chief operating officer of Cymer, "Our work with Brion extends those partnerships into computational lithography, allowing information about our advanced light sources to be applied to photomask manufacturing. We look forward to further collaborations in order to uncover new solutions for lithography optimization."

"This helps our industry by allowing more accurate models and will be embedded into all our computational lithography products by mid-year 2009," said Jim Koonmen, general manager at Brion. "At advanced semiconductor nodes, every nanometer counts. This new level of accuracy will improve lithography process control."

This collaboration shows ASML and Cymer's dedication to meeting advanced semiconductor manufacturing requirements for continuously improving accuracy. The results will be presented at the SPIE Advanced Lithography Conference on Tuesday, February 24, 2009.

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