Posted in | Microscopy | Nanoanalysis

New Ultra High Resolution FESEMs Suited to Nanotechnology Applications

Hitachi High-Technologies has launched the SU8000 family of ultra high resolution field emission scanning electron microscopes (FESEMs) for investigating the fine surface structure of materials in a wide range of nanotechnology fields. The new SU8000 Series features a common, high performance electron optical platform to provide excellent imaging performance, and offers a variety of stages, chambers and signal detection systems to meet the wide variety of customer-specific needs for ultra high resolution microscopy.

The new SU8010, SU8020 and SU8030 join the existing SU8040 to form this comprehensive family of ultra high resolution microscopes. A high brightness cold cathode field emission source is used in combination with the latest generation of Hitachi's patented super ExB in-lens detection systems for energy filtering, charge suppression, and contrast control. All microscopes offer excellent imaging performance at low accelerating voltage to minimize sample damage, and enhanced electron deceleration technology has improved resolution at ultra low landing voltages to just 1.3nm at 1.0kV.

New SU8000 Series FESEM from Hitachi High-Technologies

All members of the SU8000 family are equipped with specimen exchange chambers and lens-integrated liquid nitrogen traps as standard, guaranteeing high chamber vacuum and thus minimized contamination.

The SU8010 is the entry level model with dual (upper and lower) secondary electron detectors with secondary and backscattered electron signal mixing capabilities for versatile imaging. A 3-axis motorized stage is provided as standard, capable of accommodating samples up to 100 mm diameter.

The SU8020 offers the same sample handling capabilities using a 5-axis motorized stage as standard but benefits from Hitachi's unique triple detector system to extend the capability to collect secondary electrons and low energy backscattered electrons. This novel, ultra-sensitive detection system allows high efficiency, simultaneous multi-signal imaging and energy filtering even in beam deceleration mode, providing the capability to observe the absolute surface structure as well as properties such as surface potential contrast.


The SU8030 features a large chamber with large specimen stage for large or multiple samples. It can accommodate samples up to 150 mm in diameter. The SU8030 also benefits from the triple detector system.

The SU8040 is the top of the range model. In addition to the same detection system and chamber as used for the SU8030, the SU8040 features the "Regulus" stage which offers the extremely fine specimen stage control and repeatability that is needed for smooth operation at ultra-high magnifications, like navigation on advanced semiconductor devices.

The entire SU8000 family benefits from a user-friendly GUI, while a 24.1 inch monitor contributes to comfortable operation. A wide range of optional accessories is available to meet customer-specific needs. These include backscattered electron detectors, scanning transmission detectors, energy dispersive X-ray (EDX) analysis systems or cryogenic substages.

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