Qcept Technologies has declared that two semiconductor producers in Asia have procured and installed its ChemetriQ 5000 non-visual defect (NVD) inspection systems.
Delivering the NVD inspection on both patterned and unpatterned wafers, the system is applicable in tool and line control systems to enhance output learning rates and help consistent outputs.
One company procuredthe numerous systems to control 3X-nm-design-rule memory and logic wafers. The second procured one system to control 3X-nm-design-rule memory wafers. The systems will be installed at the clients’ manufacturing fabs for various applications such as post-cleaning surveys, reactive ion etch process control and wet cleans process control.
Enhanced semiconductor performance is due as much to material and design as to lithographic reductions. These materials and designs need accurate control of wafer cleaning and surface preparation control to make these processes crucial part of the overall output. Because wafer cleaning and surface preparation are repeated most often, sub-optimal cleaning process could result in output loss.
The platform delivers quick and complete internal tracking of NVDs resulting from sub-optimal cleans, including organic and inorganic residues, metallic pollutants and process-charging, all of which could cause output loss and untracked by visual inspection systems. It uses a tough technology to detect operational differences on the wafer surface. Features such as compact placement accuracy help capture a variety of NVDs.
Source: http://www.qceptech.com/