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GLOBALFOUNDRIES Displays Design Infrastructure for High-k Metal Gate Nanotechnology

GLOBALFOUNDRIES will display a full range of design infrastructure to customers for its 28nm High-k Metal Gate (HKMG) technology at the 48th Design Automation Conference (DAC), which is to be held at San Diego in California next week.

The company will also feature the design infrastructure required for its HKMG technology which includes process design kits (PDKs), intellectual property (IP), design-for-manufacturing (DFM), and, silicon-validated flows. The company will display methods to overcome new design challenges as the company advances beyond 20nm.

The company is supplying innovative HKMG products to clients worldwide. The 28nm technology has been implemented in SoC-based mobile devices. The 28nm technology with the Gate First approach delivers extended battery life for mobile devices with low cost and high performance.

The company’s 28nm HKMG technology is completely enabled and ready for design-in with a comprehensive set of compilers, complex IP, and libraries. It also offers both Analog Mixed-Signal (AMS) and digital design flows for its 28nm technology by working with EDA/IP ecosystem firms.

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