Posted in | News | Nanolithography

EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'

EUV Litho honored EUV Technologies with the ‘Outstanding Contribution Award' at the International Workshop on Extreme Ultraviolet (EUV) Lithography 2012 hosted by EUV Litho.

The award was presented to EUV Technologies for its technological and intellectual accomplishments over the last fifteen years towards the development of EUV lithography infrastructure. According to Moore’s Law, the average number of transistors integrated on a chip will double every 18 months. The evolution of semiconductor technology in line with the advancement dictated by Moore’s Law is possible by advancement in EUV lithography.

The International Workshop on EUV lithography is hosted every year by EUV Litho based out of Austin in Texas. The objective of the workshop is to provide a forum for interaction between the leading players in the field of EUV lithography. This year’s workshop was conducted in early June in Maui in Hawaii. EUV Technology is considered to be the global leader in EUV Metrology tools. The company has been engineering and delivering products that encompass almost all the steps involved in the inspection process for EUV lithography. Customers of EUV Technologies are major semiconductor companies across the world such as SEMATECH, Lawrence Livermore National Laboratory and IMEC. Ivan Pollentier from IMEC spoke about EUV Technologies at the Awards ceremony and expressed his company’s appreciation of EUV Technologies’ designs that are a combination of creativity and logical thinking. He also said that the tool developed by the company also scores on user friendliness. Rupert Perera, the President of EUV Technology, accepted the award.

Disclaimer: The views expressed here are those of the author expressed in their private capacity and do not necessarily represent the views of AZoM.com Limited T/A AZoNetwork the owner and operator of this website. This disclaimer forms part of the Terms and conditions of use of this website.

G.P. Thomas

Written by

G.P. Thomas

Gary graduated from the University of Manchester with a first-class honours degree in Geochemistry and a Masters in Earth Sciences. After working in the Australian mining industry, Gary decided to hang up his geology boots and turn his hand to writing. When he isn't developing topical and informative content, Gary can usually be found playing his beloved guitar, or watching Aston Villa FC snatch defeat from the jaws of victory.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Thomas, G.P.. (2019, February 11). EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'. AZoNano. Retrieved on December 01, 2024 from https://www.azonano.com/news.aspx?newsID=25541.

  • MLA

    Thomas, G.P.. "EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'". AZoNano. 01 December 2024. <https://www.azonano.com/news.aspx?newsID=25541>.

  • Chicago

    Thomas, G.P.. "EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'". AZoNano. https://www.azonano.com/news.aspx?newsID=25541. (accessed December 01, 2024).

  • Harvard

    Thomas, G.P.. 2019. EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'. AZoNano, viewed 01 December 2024, https://www.azonano.com/news.aspx?newsID=25541.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.