|    Materials scientists and engineers have  made significant developments in  the improvement  of methods of synthesis of nanomaterial solids. A brief review is given in  this article.   Processing  and Synthesis of Nanomaterials  It is classified as bottom-up  manufacturing which involves building up of the atom or molecular  constituents as against the top method which involves making smaller and  smaller structures through etching from the bulk material as exemplified by  the semiconductor industry.   Gas Condensation  Gas condensation was the first technique  used to synthesize nanocrystalline metals and alloys. In this technique, a  metallic or inorganic material is vaporized using thermal evaporation sources  such as a Joule heated refractory crucibles, electron beam evaporation  devices, in an atmosphere of 1-50 m bar. In gas evaporation, a high residual  gas pressure causes the formation of ultra fine particles (100 nm) by gas  phase collision. The ultrafiine particles are formed by collision of  evaporated atoms with residual gas molecules. Gas pressures greater than 3  mPa (10 torr) are required.   Vaporization sources may be resistive heating, high energy electron  beams, low energy electron beam and inducting heating. Clusters form in the  vicinity of the source by homogenous nucleation in the gas phase grew by  incorporation by atoms in the gas phase. It comprises of a ultra high vacuum  (UHV) system fitted evaporation source, a cluster collection device of liquid  nitrogen filled cold finger scrapper assembly and compaction device. During  heating, atoms condense in the supersaturation zone close to Joule heating  device. The nanoparticles are removed by scrapper in the form of a metallic  plate. Evaporation is to be done from W, Ta or Mo refractory metal crucibles.  If the metals react with crucibles, electron beam evaporation technique is to  be used. The method is extremely slow. The method suffers from limitations  such as a source-precursor incompatibility, temperature ranges and dissimilar  evaporation rates in an alloy. Alternative sources have been developed over  the years. For instance, Fe is evaporated into an inert gas atmosphere (He).  Through collision with the atoms the evaporated Fe atoms loose kinetic energy  and condense in the form of small crystallite crystals, which accumulate as a  loose powder. Sputtering or laser evaporation may be used instead of thermal  evaporation. Sputtering is a non-thermal process in which surface atoms are  physically ejected from the surface by momentum transfer from an energetic  bombarding species of atomic/molecular size. Typical sputtering uses a glow  discharge or ion beam. Interaction events which occur at and near the target  surface during the sputtering process in magnetron sputtering has advantage  over diode and triode sputtering. In magnetron sputtering, most of the plasma  is confined to the near target region. Other alternate energy sources which  have been successfully used to produce clusters or ultra fine particles are  sputtering electron beam heating and plasma methods. Sputtering has been used  in low pressure environment to produce a variety of clusters including Ag, Fe  and Si.   Vacuum  Deposition and Vaporization  Before proceeding to the other methods,  it is important to understand the terms vacuum deposition and vaporization or  vacuum evaporation. In vacuum deposition process, elements, alloys or  compounds are vaporized and deposited in a vacuum . The vaporization source  is the one that vaporizes materials by thermal processes. The process is  carried out at pressure of less than 0.1 Pa (1 m Torr) and in vacuum levels  of 10 to 0.1 MPa. The substrate temperature ranges from ambient to 500°C. The  saturation or equilibrium vapor pressure of a material is defined as the  vapor pressure of the material in equilibrium with the solid or liquid  surface. For vacuum deposition, a reasonable deposition rate can be obtained  if the vaporization rate is fairly high. A useful deposition rate is obtained  at a vapor pressure of 1.3 Pa (0.01 Torr).   Vapor phase nucleation can occur in dense  vapor cloud by multibody collisions, The atoms are passed through a gas to  provide necessary collision and cooling for nucleation. These particles are  in the range of 1 to 100 nm and are called ultra fine particles or clusters.  The advantages associated with vacuum deposition process are high deposition  rates and economy. However, the deposition of many compounds is difficult.  Nanoparticles produced from a supersaturated vapor are usually longer than  the cluster.   Chemical  Vapor Deposition (CVD) and Chemical Vapor Condensation (CVC)  CVD is a well known process in which a  solid is deposited on a heated surface via a chemical reaction from the vapor  or gas phase. CVC reaction requires activation energy to proceed. This energy  can be provided by several methods. In thermal CVD the reaction is activated  by a high temperature above 900oC. A typical apparatus comprises of gas  supply system, deposition chamber and an exhaust system. In plasma CVD, the  reaction is activated by plasma at temperatures between 300 and 700°C. In  laser CVD, pyrolysis occurs when laser thermal energy heats an absorbing  substrate. In photo-laser CVD, the chemical reaction is induced by ultra  violet radiation which has sufficient photon energy, to break the chemical  bond in the reactant molecules. In this process, the reaction is photon  activated and deposition occurs at room temperature. Nano composite powders  have been prepared by CVD. SiC/Si3N composite  powder was prepared using SiH4, CH4, WF6  and H2 as a source of gas at 1400°C. Another process called chemical  vapor condensation (CVC) was developed in Germany  in 1994. It involves pyrolysis of vapors of metal organic precursors in a  reduced pressure atmosphere. Particles of ZrO2, Y2O3  and nanowhiskers have been produced by CVC method. A metalorganic precursor  is introduced in the hot zone of the reactor using mass flow controller. For  instance, hexamethyldisilazane (CH3)3  Si NHSi (CH3)3 was used to produce SiCxNyOz powder by CVC technique. The reactor  allows synthesis of mixtures of nanoparticles of two phases or doped  nanoparticles by supplying two precursors at the front end of reactor and  coated nanoparticles, n-ZrO2, coated with n-Al2O3  by supplying a second precursor in a second stage of reactor. The process  yields quantities in excess of 20 g/hr. The yield can be further improved by  enlarging the diameter of hot wall reactor and mass of fluid through the  reactor. Typical nanocrystalline materials which have been synthesized are shown  in Table 1.    Table 1. Typical nanocrystalline materials synthesized by the CVC method          |          |                            |      (CH3)    3SiNHSi(CH3) 3      |          SiCxNyOz      |          Amorphous      |          4      |          377      |            |      Si(CH3)4      |          SiC      |          β-phase      |          9      |          201      |            |      Al[2-OC4H9]3      |          Al2O3      |          Amorphous      |          3.5      |          449      |            |      Ti[I-OC3H7]4      |          TiO2      |          Anatase      |          8      |          193      |            |      Si[OC2H5]4      |          SiO2      |          Amorphous      |          6      |          432      |            |      Zr[3-OC4H9]4      |          ZrO2      |          Monoclinic      |          7      |          134      |          Mechanical Attrition  Unlike many of the methods mentioned  above, mechanical attrition produces its nanostructures not by cluster  assembly but by the structural decomposition of coarser grained structures as  a result of plastic deformation. Elemental powders of Al and β-SiC were prepared in a  high energy ball mill. More recently, ceramic/ceramic nanocomposite WC-14%  MgO material has been fabricated. The ball milling and rod milling techniques  belong to the mechanical alloying process which has  received much attention as a powerful tool for the fabrication of several  advanced materials. Mechanical alloying is a unique process, which can be  carried out at room temperature. The process can be performed on both high  energy mills, centrifugal type mill and vibratory type mill, and low energy  tumbling mill.   Examples of  High Energy Mills  High energy mills include:   •        Attrition Ball Mill   •        Planetary Ball Mill   •        Vibrating Ball Mill   •        Low Energy Tumbling Mill   •        High Energy Ball Mill   Attrition Ball Mill  The milling procedure takes place by a  stirring action of a agitator which has a vertical rotator central shaft with  horizontal arms (impellers). The rotation speed was later increased to 500  rpm. Also, the milling temperature was in greater control.   Planetary Ball Mill  Centrifugal forces are caused by rotation  of the supporting disc and autonomous turning of the vial. The milling media  and charge powder alternatively roll on the inner wall of the vial and are  thrown off across the bowl at high speed (360 rpm).   Vibrating Ball Mill  It is used mainly for production of  amorphous alloys. The changes of powder and milling tools are agitated in the  perpendicular direction at very high speed (1200 rpm).   Low Energy  Tumbling Mill  They have been used for successful  preparation of mechanically alloyed powder. They are simple to operate with  low operation costs. A laboratory scale rod mill was used to prepare  homogenous amorphous Al30Ta70 powder by  using S.S. cylinder rods. Single-phase amorphous powder of AlxTm100-x with  low iron concentration can be formed by this technique.   High Energy Ball  Mill  High-energy ball milling is an already  established technology, however, it has been considered dirty because of  contamination problems with iron. However, the use of tungsten carbide  component and inert atmosphere and /or high vacuum processes has reduced  impurity levels to within acceptable limits. Common drawbacks include low  surface, highly poly disperse size distribution, and partially amorphous  state of the powder. These powders are highly reactive with oxygen, hydrogen  and nitrogen. Mechanical alloying leads to the fabrication of alloys, which  cannot be produced by conventional techniques. It would not be possible to  produce an alloy of Al-Ta, because of the difference in melting points of Al  (933 K) and Ta (3293 K) by any conventional process. However, it can be  fabricated by mechanical alloying using ball milling process.   Other Processes  Several other processes such as  hydrodynamic cavitation micro emulsion and sonochemical processing techniques  have also been used. In cavitation process nanoparticles are generated  through creation and release of gas bubbles inside the sol-gel solution. By  pressurizing in super critical drying chamber and exposing to cavitational  disturbances and high temperature heating, the sol-gel is mixed. Te erupted  hydrodynamic bubbles cause the nucleation, growth and quenching of  nanoparticles. Particle size can be controlled by adjusting pressure and  solution retention times.   Sol-Gel Techniques  In addition to techniques mentioned  above, the sol-gel processing techniques have also been extensively used.  Colloidal particles are much larger than normal molecules or nanoparticles.  However, upon mixing with a liquid colloids appear bulky whereas the  nanosized molecules always look clear. It involves the evolution of networks  through the formation of colloidal suspension (sol) and gelatin to form a  network in continuous liquid phase (gel). The precursor for synthesizing  these colloids consists of ions of metal alkoxides and aloxysilanes. The most  widely used are tetramethoxysilane (TMOS), and tetraethoxysilanes (TEOS)  which form silica gels. Alkoxides are immiscible in water. They are organo  metallic precursors for silica, aluminum, titanium, zirconium and many  others. Mutual solvent alcohol is used. The sol gel process involves  initially a homogeneous solution of one or more selected alkoxides. These are  organic precursors for silica, alumina, titania, zirconia, among others. A  catalyst is used to start reaction and control pH. Sol-gel formation occurs  in four stages.   •        Hydrolysis   •        Condensation   •        Growth of particles   •        Agglomeration of particles   Hydrolysis  During hydrolysis, addition of water  results in the replacement of [OR] group with [OH-] group.  Hydrolysis occurs by attack of oxygen on silicon atoms in silica gel.  Hydrolysis can be accelerated by adding a catalyst such as HCl and NH3.  Hydrolysis continues until all alkoxy groups are replaced by hydroxyl groups.  Subsequent condensation involving silanol group (Si-OH) produced siloxane  bonds (Si-O-Si) and alcohol and water. Hydrolysis occurs by attack of oxygen  contained in the water on the silicon atom.   Condensation  Polymerization to form siloxane bond  occurs by either a water producing or alcohol producing condensation  reaction. The end result of condensation products is the formation of  monomer, dimer, cyclic tetramer, and high order rings. The rate of hydrolysis  is affected by pH, reagent concentration and H2O/Si molar  ratio (in case of silica gels). Also ageing and drying are important. By  control of these factors, it is possible to vary the structure and properties  of sol-gel derived inorganic networks.   Growth and  Agglomeration  As the number of siloxane bonds increase,  the molecules aggregate in the solution, where they form a network, a gel is  formed upon drying. The water and alcohol are driven off and the network  shrinks. At values of pH of greater then 7, and H2O/Si  value ranging from 7 to 5. Spherical nano-particles are formed.  Polymerization to form siloxane bonds by either an alcohol producing or water  producing condensate occurs.   2  HOSi (OR)3 → (OR)3 Si O Si (OR)3 + H2O   or   2  HOSi (OR) 3 → (OR)2OH Si O Si (OR)3  + H2O   Above pH of 7, Silica is more soluble and  silica particles grow in size. Growth stops when the difference in solubility  between the smallest and largest particles becomes indistinguishable. Larger  particles are formed at higher temperatures. Zirconium and Yttrium gels can  be similarly produced.   Despite improvements in both chemical and  physical methods of synthesis, there remain some problems and limitations.  Laser vaporization technique has offered several advantages over other  heating techniques. A high energy pulsed laser with an intensity flux of 106  - 107 W/cm2 is forced on target material. The plasma causes high vaporization  and high temperature (10,000°C). Typical yields are 1014-1015 atoms from the  surface area of 0.01 cm2 in a 10-8 s pulse. Thus a high  density of vapor is produced in a very short time (10-8 s), which is useful  for direct deposition of particles.    Electrodeposition  Nanostructured materials can also be  produced by electrodeposition. These films are mechanically strong, uniform  and strong. Substantial progress has been made in nanostructured coatings  applied either by DVD or CVD. Many other non-conventional processes such as  hypersonic plasma particle deposition (HPPD) have been used to synthesize and  deposit nanoparticles. The significant potential of nanomaterial synthesis  and their applications is virtually unexplored. They offer numerous  challenges to overcome. Understanding more of synthesis would help in  designing better materials. It has been shown that certain properties of  nanostructured deposits such as hardness, wear resistance and electrical  resistivity are strongly affected by grain size. A combination of increased  hardness and wear resistance results in a superior coating performance.    |