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AIXTRON REceives New Order from Genesis Photonics

AIXTRON AG today announced a new order for six new generation CRIUS II 55x2-inch configuration deposition systems from existing customer Genesis Photonics Inc. The Taiwan based company placed the order during the second quarter of 2010.

From AIXTRON SE 23 Sep 2010

Northeastern University’s Center for High-Rate Nanomanufacturing Signs Agreement with Federal Health Agency

Northeastern University’s Center for High-rate Nanomanufacturing (CHN), a National Science Foundation-funded Nanoscale Science and Engineering Center, has signed an agreement with federal health researchers to advance research and guidance for occupational safety and health in nanotechnology, marking a significant step forward in the emerging field.

22 Sep 2010

Vistec Lithography Receives Order for EBPG5200 System from AMO

Vistec Lithography, Inc., a leading supplier of advanced electron-beam lithography systems, announced today that AMO GmbH, a research service provider for nanotechnology located in Aachen (Germany), has placed an order for Vistec’s electron-beam lithography system EBPG5200.

21 Sep 2010

Applied Nanotech to Showcase New Metallic Inks and Pastes at NIP show

Applied Nanotech Holdings, Inc. announced that it will showcase some of its key nanotechnology advancements in metallic inks and pastes at the NIP26 Digital Printing Technologies Conference being held at the Hilton Hotel in Austin, TX from September 21-23, 2010.

From Nano Magic, LLC. 21 Sep 2010

Researchers Develop Reversible Adhesion Method for Printing Electronics on Variety of Tricky Surfaces

Geckos are masters at sticking to surfaces of all kinds and easily unsticking themselves, too. Inspired by these lizards, a team of engineers has developed a reversible adhesion method for printing electronics on a variety of tricky surfaces such as clothes, plastic and leather.

20 Sep 2010

Carl Zeiss ORION Plus Helium Ion Microscope Moves Beyond Sub-Nanometer Imaging to Nanofabrication

Scientists are currently investigating new uses for Helium Ion microscopy in nano-patterning. Since it is not limited by the proximity effect of conventional e-beam lithography, Helium Ion technology seems to be an up-an...

From Carl Zeiss Microscopy GmbH 20 Sep 2010

Engineer Etches a Utah Medallion the Size of a Blonde’s Hair

In an example of how a technology wonk displays school spirit, an engineer has created a golden University of Utah logo that is smaller than the width of an average human hair.

17 Sep 2010

Bayer Materialscience Develops Film Technologies for Printed Polymer Electronics

Bayer MaterialScience has developed extensive technology know-how and a wide range of materials for customers who print polycarbonate films with electronic functions and process these into 3D electronic components using the film insert molding process.

17 Sep 2010

SOKUDO to Join Multiple E-Beam Lithography Program

SOKUDO Co., Ltd., the lithography coat/develop track, process equipment, joint venture company, and CEA-Leti today announced that SOKUDO will join the new industry/research multi-partner program IMAGINE that is developin...

17 Sep 2010

Oxford Instruments Plasma Technology Receives Order From Nanotechnology Institute

Oxford Instruments Plasma Technology, leader in etch, deposition and growth systems, has recently received an order for three plasma etch and deposition tools from the Centre of Excellence in Nanoelectronics (CEN) at the Indian Institute of Science (IISc) in Bangalore, India.

From Oxford Instruments Plasma Technology 15 Sep 2010