Nanoelectronics News

RSS

Altair Nanotechnologies Announces Shipment of 40 Advanced Battery Systems to U.S. Army

Altair Nanotechnologies Inc. (Altairnano) (NASDAQ: ALTI), a leading provider of energy storage systems for clean, efficient power and energy management, announced today the shipment of 40 advanced battery systems in support of the Army's M119 105mm lightweight gun digitization program.

From Altair Nanotechnologies 22 Apr 2009

World's First Functional 22nm CMOS SRAM Cells Made Using EUV Lithography

Today, IMEC presented the world's first functional 22nm CMOS SRAM cells made using EUV lithography. The 0.099µm² SRAM cells are made with FinFETs and have both the contact and metal1 layer printed using ASML's full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT).

From IMEC 22 Apr 2009

ACEplorer Giving System Architects the Power of Fast and Efficient Handling of Power and Thermal Issue at Higher Level

DOCEA Power, an electronic system level (ESL) company that delivers power and thermal analysis software for the electronics design applications, today announced ACEplorer®, the first ESL software tool that allows des...

22 Apr 2009

International Conference Exploring the Frontiers of Nanoelectronics

New methods for exploring the behavior of the high-performance electronics materials and devices that will shape the future of the electronics industry will be the focus of the International Conference on Frontiers of Ch...

21 Apr 2009

Applied Materials Receives Prestigious 2008 Supplier Excellence Award from TI

Applied Materials, Inc. announced today that it has received the prestigious 2008 Supplier Excellence Award from Texas Instruments (TI) for the outstanding contributions of Applied's service group.

From Applied Materials Inc. 21 Apr 2009

Toppan Printing Established New Photomask Manufacturing Process to Support 32nm and 28nm Semiconductor Device Production

Toppan Printing Co., Ltd. has established a new and improved photomask manufacturing process in April 2009 at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production. This photoma...

21 Apr 2009

Silicon-Proven Reference Design Approach Accelerates RF Designs and Enables Systems-on-Chip Integration

Taiwan Semiconductor Manufacturing Company, Ltd. (TSE: 2330; NYSE: TSM) today unveiled the foundry industry's first Mixed Signal/Radio Frequency Reference Design Kit (MS/RF RDK) at its North American Technology Sympo...

From TSMC Taiwan Semiconductor Manufacturing Company 21 Apr 2009

AIXTRON Receives Order for Black Magic PECVD for Carbon Nanotube Growth from GaTech

AIXTRON AG announced the receipt of a purchase order for a 4" Black Magic PECVD for carbon nanotube (CNT) growth from The Georgia Institute of Technology (GaTech) in Atlanta, GA, USA within the first quarter 2009.

From AIXTRON SE 21 Apr 2009

Rudolph Technologies Joins SEMATECH's 3D Interconnect Program at UAlbany NanoCollege

Rudolph Technologies, Inc. (NASDAQ: RTEC) and SEMATECH, the global consortium of leading chipmakers, announced today that Rudolph has joined SEMATECH's 3D Interconnect Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

From Onto Innovation 21 Apr 2009

IMEC Successfully Transferred MemoryVAM to Samsung Electronics

IMEC successfully transferred MemoryVAM (Memory Variability Aware Modeling), the first EDA tool for statistical memory analysis, to Samsung Electronics. The tool predicts yield loss of SRAMs caused by the process variations of deep-submicron IC technologies.

From IMEC 21 Apr 2009

Nanoelectronics News

Altair Nanotechnologies Announces Shipment of 40 Advanced Battery Systems to U.S. Army

World's First Functional 22nm CMOS SRAM Cells Made Using EUV Lithography

ACEplorer Giving System Architects the Power of Fast and Efficient Handling of Power and Thermal Issue at Higher Level

International Conference Exploring the Frontiers of Nanoelectronics

Applied Materials Receives Prestigious 2008 Supplier Excellence Award from TI

Toppan Printing Established New Photomask Manufacturing Process to Support 32nm and 28nm Semiconductor Device Production

Silicon-Proven Reference Design Approach Accelerates RF Designs and Enables Systems-on-Chip Integration

AIXTRON Receives Order for Black Magic PECVD for Carbon Nanotube Growth from GaTech

Rudolph Technologies Joins SEMATECH's 3D Interconnect Program at UAlbany NanoCollege

IMEC Successfully Transferred MemoryVAM to Samsung Electronics

New Nanomaterial Offers Sustainable Drinking Water Solution

Nano-Formulations Boost Plant Growth and Inhibit Nematode Production

New Flexible Material Senses Temperature Without External Power

Carbon Nanofibers Boost Strength and Durability of Fiber Composites

Rapid Biomimetic Nanovaccine for Personalized Cancer Therapy

Enhancing Slurry Stability in Lithium-Ion Batteries with Turbiscan Technology

PiFM and its Role in Nanoscale Chemical Imaging

Conversations on AFM: How AI is Automating Scanning Probe Microscopy

Sponsored Content

What is AFM-IR?

Ultimate Guide to Nanoscale Polymer Analysis with Photothermal AFM-IR

Atomic Force Microscopy Analysis of Polymer Stiffness Under Thermal Stress

Different DLS-Based Systems Can Give Us Different Size Results, and All of Them Can Be correct!