Posted in | Nanolithography

CEA-Leti Announces Second Maskless Lithography IMAGINE Workshop in Tokyo

CEA-Leti has declared that the second Maskless Lithography IMAGINE Workshop will be conducted on September 6, 2011 at the Keio Plaza Hotel located in Tokyo.

CEA is an organization conducting research and development activities in security, defense, healthcare, IT and energy, and CEA’s institute Leti is a specialist in nanotechnology- based applications ranging from photonics, healthcare and biology to wireless systems and devices.

The Netherlands-based MAPPER produces maskless-lithography devices for the semiconductor market. It is sustaining the IMAGINE program with its massively parallel electron-beam platforms.

In July 2009, MAPPER Lithography and CEA-Leti had introduced the IMAGINE program with supply of massively parallel electron beam platform of MAPPER to Leti. The electron beam platform is the fundamental technology based, on which the IMAGINE program is designed.

During the IMAGINE workshop, the participants will study about the technology roadmap of MAPPER and obtain a technical update on the major accomplishments of the program. They will also know and converse about the lithography Choices for the 22 nm node and above.

The IMAGINE workshop offers a chance to the major chip producers of the world to evaluate the maskless lithography technology in the actual production conditions. Moreover, as part of its efforts for its industrial launch, the program will create and qualify the entire infrastructure, including data preparation and process integration.


Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback