[AWARD] High-gain, high-efficiency wideband antennas? Researchers at CEA Leti push the limits of telecommunications… https://t.co/RmC9aVnTJV
Sep 26 2022 11:21am
[EVENT] CEA-Leti is present at ESSCIRC - ESSDERC 2022 with 5 papers for this 2022 edition!
More information:… https://t.co/btjlJ00JNT
Sep 21 2022 8:11am
[EVENT] CEA-Leti will be at the ECML PKDD conference! Come and test our manual driver distraction detection system… https://t.co/RB7W3Jwgsw
Sep 15 2022 11:15am
Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics.
NEMS and MEMS are at the core of its activities. In addition to Leti’s 1,700 employees, there are more than 250 students involved in research activities, which makes Leti a mainspring of innovation expertise. Leti’s portfolio of 1,880 families of patents helps strengthen the competitiveness of its industrial partners.
For research that meets the needs of industry as fully as possible, Leti has established unique technological resources, including a nanocharacterization platform and 300mm and 200mm lines for nanoelectronics and MEMS, 3D integration, in 8,000 m² of clean rooms.
LETI, along with 32 other research institutes, makes up the network of Instituts Carnot, working closely with manufacturers to foster innovation and economic development.
LETI has forged close partnerships all over the world, forming the Heterogeneous Technology Alliance with Fraunhofer (DE), CSEM (CH) and VTT (FI), creating the NanoVLSI Alliance with Caltech, partnering with IBM and ST in nanoelectronics, and joining forces with the Micromachine Center in Japan.
Impulse Radio Ultra-Wideband Integrated Circuits
Picosecond Acoustic Analysis for Nanomaterials
Weebit Nano and Leti File Three New Patents for Improved Yield and Reliability of Advanced ReRAM Products
Weebit Nano and Leti File Two New Patents Optimizing ReRAM Performance
Leti Develops Local-strain Techniques in FD-SOI Fabrication To Improve Next-Generation Performance, Energy Use
ETPN to Help EU Companies Bring Innovative Nanomedicines to Market
Leti Demonstrates Compatibility of 200mm MEMS Platform with 300mm Wafer Fabrication
CEA-Leti Announces Feasibility of CoolCube in FinFET Technology on 300mm Production Line
CEA-Leti Launches European Nano-Characterisation Laboratory Funded by the Horizon 2020 Programme
DATE 2015: CEA-Leti to Present Newest Version of Leti-UTSOI2 for UTBB-FDSOI Technology
CEA-Leti Launches Silicon Impulse IC Design Competence Center
SPTS Enters Agreement with CEA-Leti to Develop 3D High Aspect Ratio Through-Silicon-Via Solutions
CEA-Leti and Akrivis Collaborate to Develop Highly Targeted Nanomedicine Platform
DebioJect Micro-needle Using Leti’s MEMS Technology Nominated for Coveted Award
Silicon-Based Micro-Pump for Smart Drug Delivery Fabricated Using MEMS Standard Process
CEA-Leti Fabricates Ultra-Scaled Split-gate Memories with Gate Length of 16nm
Rudolph Sells NSX 320 TSV Metrology System to CEA-Leti
New Project to Develop ALD Materials and Tools for High-Density 3D Integrated Capacitors
CEA-Leti and Capsum Announce First Commercial Use of Lipidots Nanovector Technology
CEA-Leti Programs Extend 193nm Immersion Lithography for 1X Nodes
CEA-Leti to Host Workshop on Future Technology Developments at SEMICON West 2013
Researchers at CEA-Leti Win the Avantex Innovation Prize for Application of E-Thread Technology
CEA-Leti to Highlight Latest Micro- and Nanotechnology Innovations at its Annual Review
CEA-Leti’s Advances in MEMS to be Presented at Transducers’ 2013 and Eurosensors XXVII
CEA-Leti and BeSpoon Extend Inch-level Accuracy of IR-UWB Integrated Circuit
CEA-Leti Selects Veeco MOCVD System for Nanowire-LED Program with Aledia
CEA-Leti to Chair Seven Sessions at Design, Automation & Test in Europe 2013
Attolight’s Cathodoluminescence Microscopy to Play Key Role in Joint Development Program with CEA-Leti
CEA-Leti Reports Latest Achievements on MAPPER’s Lithography Solution
Caltech and CEA-Leti Alliance Launch Analytical Pixels to Develop and Commercialize Nanosystems
JSR Micro, CEA-Leti Partner to Design Lithography Processes at Sub-20 nm Node
CEA-Leti Includes Synopsys in IMAGINE Program on Maskless Lithography
CEA-Leti Announces Second Maskless Lithography IMAGINE Workshop in Tokyo
CEA-Leti, Replisaurus Optimize ElectroChemical Pattern Replication Process to Prevent Defects in Wafer
Entegris and CEA-Leti to Address Molecular Contamination Problems Between Semiconductor Wafers and Containers
EV Group Declares CEA-Leti Has Incorporated EVG Tools in its 300mm Clean-Room
Mentor Graphics to Develop Multi E-Beam Lithography Flows in CEA-Leti’s IMAGINE Program
CEA-Leti, Freescale to Continue Focus on Developing New MEMS Technology
CEA-Leti, ASELTA to Develop E-Beam Proximity Effects Correction Solutions for Maskless Lithography
FEI to Provide TEM Technology to CEA-Leti to Characterize 22nm Semiconductor Materials
HelioVolt Announces Completion of Lifetime Testing of First Commercial Thin-Film Modules
CEA-Leti Collaborates with SHINKO to Develop Advanced Semiconductor Packaging Technology
CEA-Leti to Present New Findings on Silicon Nanowires at IEDM/IEEE 2010
Atrenta, CEA-Leti to Focus on Advanced Power Reduction and 3D Design
Caltech Releases NanoSystems Partnership Program Along with CEA-Leti
CEA-Leti Showcases Latest in Lithography, FDSOI and 3D Design ad Integration at Semicon Europa
CEA-Leti, SPTS to Develop New Processes for 3D-ICs
CEA-Leti, CMP Launch New Initiative Based on Fully Depleted SOI 20nm Technology
CEA-Leti Partners Win Business Creation Awards From Ministry for Higher Education and Research
DFI Nanotechnology Announces Completion of its Largest All-Glass Vapor Chamber
CEA Leti Selects Eyelit’s Software Suite to Support MEMS Production in France
CEA-Leti Co-Sponsors 2010 IEEE International Conference on IC Design and Technology
STMicroelectronics Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography
Leti to Host Workshop on Innovative Memory Technologies
CEA/Leti and IBM to Collaborate on Research in Semiconductor and Nanoelectronics Technology
CEA-LETI Extends Transistor Dimension Scaling Using 3D Nanowire FET
Microoled and CEA-Leti Announce World's Most Efficient Silicon-Based OLED Microdisplay
mPhase's Smart NanoBattery to Feature in Technology Advances Section of September 2008 MRS Bulletin
Jingang Li, Ph.D.
In this interview, AZoNano discusses the development of a novel solid-state optical nanomotor, which is driven by light.
Professor Jacek Jasienak
In this interview, we discuss a nanoparticle ink used to produce low-cost printable perovskite solar cells, helping to catalyze the technology transition toward commercial viable perovskite-based devices.
Ping Wang, Ph.D.
We speak with researchers behind the latest advancement in graphene hBN research that could boost the development of next-generation electronic and quantum devices.
Inoveno’s PE-550 is a best-selling electrospinning/spraying machine that can be used for the continuous production of nanofibers.
The Filmetrics R54 advanced sheet resistance mapping tool for semiconductor and compound semiconductor wafers.
The Filmetrics F40 turns your benchtop microscope into an instrument for measuring thickness and refractive index.