Vistec Lithography Receives Major Order from Helmholtz-Zentrum Berlin

Vistec Lithography Inc., a global supplier of electron-beam lithography systems, announced that they have received a major order from Helmholtz-Zentrum Berlin in Berlin-Adlershof for one of its Vistec EBPG5000plus electron-beam lithography systems. The Helmholtz-Zentrum Berlin and Vistec Lithography Inc. will work together on further enhance the Gaussian Beam system to fulfil the challenging requirements for generating advanced diffractive optics required for the X-ray imaging activities at BESSY II, the only German 3rd generation synchrotron radiation facility.

BESSY II is now operated by the new Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (HZB), which has been formed by the merger of the Hahn-Meitner-Institut Berlin (HMI) and BESSY. Beside other synchrotron applications Helmholtz-Zentrum Berlin pursues on high-resolution X-ray microscopy.

Fresnel zone plates are the key elements for high resolution X-ray microscopy. The achievable resolution of an X-ray microscope depends strongly on the optical performance of the Fresnel lenses. This is where the new electron-beam lithography system comes into play. The Vistec EBPG5000plusES is used for patterning Fresnel zone plates with a minimum zone width below 20 nm, in combination with superb placement and overlay figures. It’s worth saying that the system can also be used for more standard e-beam lithography applications.

“The EBPG5000plusES combines both excellent resolution and the highest accuracy, which allows us to pattern the most enhanced Fresnel optics for soft and hard X-rays. With the new e-beam lithography system, we expect to develop stacked zone plates with unique performance in spatial resolution and efficiency for the soft and hard X-ray photon energy range”, said Dr. Gerd Schneider, Head of the X-ray microscopy activities at the Helmholtz-Zentrum Berlin.

The order from HZB is in line with other Vistec electron-beam lithography systems currently installed at leading edge research institutes worldwide. Based on reliable and well-proven system architecture, the Vistec EBPG5000plusES system provides a spot size down to <2.2nm at 100keV beam energy, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. As a result of its high flexibility and easy–to-use software, the EBPG5000plusES has become the “system of choice” in the research community.

“We are very pleased to have received this order from the Helmholtz-Zentrum Berlin für Materialien und Energie GmbH. We are looking forward to contributing to the success of our customers’ challenging projects with our electron-beam technology”, says Rainer Schmid, General Manager at Vistec Lithography Inc.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.