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Book on Thin Film Growth Methods

Research and Markets has added another book, titled, Thin Film Growth: Physics, Materials Science and Applications" to its collection.

Thin film technology has been used in optics, microelectronics, micromechanics, hard and corrosion resistant coatings industries.

The book speaks about the theoretical modelling and deposition methods applied for the development of thin films. It concentrates on mechanism and methods used for the growth of thin film. It also focuses on electronic properties and adsorbing conduct of thin films having polar characteristics.

The book is divided into two parts. The first part talks about thin film formation theory and the second part focuses on the methods used for the growth of thin films.

Part one contains five chapters including nucleation measurement and processes for the formation of thin films, Quantum electronic stability of thin films, which are uniform atomically, phase-field model for thin film growth, examination of the development of roughness in the surface of thin films and designing thin film deposition methods through real-time observation.

Part two discusses silicon thin film developed through oblique angle deposition on surface templates, growth of thin films using reactive magnetron sputtering for nitrides, which are thermally not stable. The second part also comprises phase transition details of colloidal crystal thin films, epitaxial graphene thin film growth on single crystal metal surfaces, molecular beam epitaxy for ZnO and III-nitrides and buckling and substrate plasticity of thin films.

The book has been edited by Professor Zexian Cao from the Institute of Physics in the Chinese Academy of Sciences at Beijing.

It is a reference material for mechanical, energy materials and electronics engineers.

Source: http://www.researchandmarkets.com/

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