Dec 3 2008
Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced process control metrology equipment, today announced the launch of its Caliper InSight, a turnkey, image-based overlay metrology solution for advanced high-volume IC manufacturing.
Following the success of the Caliper élan and Caliper Ultra systems supporting the 90nm, 65nm and 45nm technology nodes, the Caliper InSight takes the next step forward in platform and optical design to improve system precision and throughput for overlay metrology solutions down to the 32nm and 22nm technology nodes.
“With the launch of the Caliper InSight, we continue to strengthen and expand product offerings in our core markets,” commented Tim Stultz, president and chief executive officer of Nanometrics. “By working closely with our customers, we are able to continue to deliver maximum value through innovative technology platforms and product performance which meets their technology needs and timelines. A major milestone for this product launch was the selection of the Insight by a key Asian customer, who has put the system into production for measurement of their most advanced DRAM and Flash devices.”
“The Caliper InSight is the next offering in a series of products designed to complement Nanometrics’ new Lynx™ cluster metrology platform,” added David Doyle, director of Nanometrics’ Standalone Business Unit. “Combining the InSight with an IMPULSE™ (OCD) module onto a Lynx platform, we offer our customers a more complete solution for advanced lithography process control, all within a single system having the lowest cost of ownership in the industry.”
Caliper InSight, Lynx and IMPULSE are trademarks of Nanometrics Incorporated.