Nanometrics, Inc., a leading supplier of advanced integrated and stand-alone metrology equipment for the semiconductor industry, today introduced the newest version of its overlay control system, the Nanometrics Orion Advanced Overlay Control System, an advanced overlay metrology and analysis system for monitoring microlithography stepper performance. Making its debut today at SEMICON Korea, the newest Orion provides exceptional throughput and measurement performance required by today’s demanding 200mm and 300mm overlay control applications. Nanometrics will have more information on the Orion Advanced Overlay Control System at its booth, No. 218, in the Pacific Hall of the Conference and Exposition Centre (COEX) at SEMICON Korea.
The Nanometrics Orion is based on Nanometrics’ highly successful Atlas platform and offers high throughput in excess of 180 wafers per hour. Orion utilizes a proprietary optical system to provide low total measurement uncertainty (TMU), enabling 1 nanometer, 3-sigma precision in overlay control applications. Orion’s live image metrology with proprietary digital image folding tolerates wide process variations and eliminates the possibility of flier data. Both attributes are crucial elements in attaining high yields in 200mm and 300mm volume production.
“As the industry’s adoption of advanced 300mm production continues to gain momentum, manufacturers absolutely need to achieve higher yields to realize the benefits of their processing investment,” said John Heaton, president and CEO of Nanometrics. “The Nanometrics Orion was developed to target this goal by offering exceptionally high throughput and precision for 300mm high volume production, advanced overlay control applications.”
The Nanometrics Orion’s real-time auto-focusing provides optimal precision at maximum throughput and eliminates focus failure and added focus time. The system is enhanced by optimized measurement algorithms. Real-Time registration, analysis and control software provides the fastest time-to-decision, and supports simultaneous recipe creation and data review during wafer measurement.