Article - 26 Mar 2004
New measurements of key wavelengths of ultraviolet light—down to a few millionths of a nanometer—are among the most precise ever reported and are improving calibrations of microlithography tools used...
News - 18 Feb 2015
Gigaphoton Inc., a major lithography light source manufacturer, announced today that it will begin shipment of its newest ArF Excimer laser, GT64A4, in February.
An important feature of the GT64A4...
News - 2 Jul 2013
Gigaphoton, Inc. a major lithography light source manufacturer, announced today that it has completed delivery of its first ArF immersion Excimer laser supporting 450mm multi-patterning, the GT64A,...
News - 7 Dec 2011
Gigaphoton, a provider of lithography light sources, has announced the delivery of its 1,000th excimer laser for photolithography applications in semiconductor fabrication.
The GT63A line, a...
News - 19 Feb 2013
Gigaphoton, Inc., a major lithography light source manufacturer, announced today that its state-of-the-art GT64A ArF excimer lasers for scanners targeting 450mm wafer production are now available...
Article - 16 Sep 2009
Optical lithography has driven many of the advances in nano-scale manufacturing, with its ability to print ever smaller features as the technology matures.