UHV Surface Analysis System for Thin Film Depth Profiling from Hiden Analytical

Hiden Analytical provides versatile high-sensitivity instrumentation for high-performance dynamic and static SIMS (secondary ion mass spectrometry) analysis, unlocking new levels of precision in cutting-edge applications.

With an extended range and the ability to acquire and identify both positive (+ve) and negative (–ve) secondary ions, the SIMS workstation is a comprehensive solution for composition analysis and depth profiling applications.

Hiden Analytical has also developed the revolutionary Hi5 SIMS workstation, which enables simultaneous positive and negative ion analysis within a comprehensive SIMS package.

Overview

SIMS for Surface Analysis

Video Credit: Hiden Analytical

Secondary ion mass spectrometry, or SIMS, is one of the most sensitive methods for studying a material's highest surface layers, ranging from several hundred nanometers (nm) to a single atomic layer. It can collect compositional data down to the parts per billion (ppb) level and is compatible with any substance that can be examined satisfactorily under vacuum conditions.

SIMS devices are commonly used to analyze ceramics, metals, organic materials, polymers, semiconductors, and more.

This technology is divided into two categories: dynamic and static SIMS. Both types use a primary ion beam that impacts a sample under vacuum conditions, causing extremely small volumes of material to be ejected from the surface; a fraction of this ejected material is ionized. The sample inlet of the mass spectrometry instrument collects these secondary ions, enabling a thorough understanding of the composition of the specimen's topmost surface layers.

The fundamental difference between dynamic and static SIMS is the ion dosage - dynamic SIMS instruments require a larger dose - and dynamic SIMS cannot be operated with a defocused ion beam; instead, it must be raster swept across the sample surface to generate a flat-bottomed crater.

Hiden Analytical's SIMS workstation is capable of performing both dynamic and static SIMS analyses in a single, consolidated piece of equipment. The SIMS workstation, equipped with a dual-mode MAXIM mass spectrometer, can operate in two modes: secondary ion detection mode for positive/negative ion detection and secondary neutral detection mode for quantification of positive data. Each mode is suitable for mass ranges of up to 5000 atomic mass units (amu).

Hiden Analytical’s SIMS Workstation

The SIMS workstation is a comprehensive solution for depth profiling and compositional analysis of materials across various fields, including surface analysis, thin film engineering, nanotechnology, fuel cell research, and others. The system is extremely configurable to meet the individual needs of users in difficult sectors.

Features

  • Fast sample transfer, sample holder, and manipulator with load lock
  • UHV manipulator for optimum sample positioning
  • SIMS elemental imaging option for ESM LabVIEW SIMS Imaging Program
  • Static SIMS Spectral Library available
  • Automatic SIMS ion optics lens tuning
  • Automatic mass alignment for optimum SIMS performance
  • Hide MAXIM SIMS analyzer working under MASsoft Professional for ppb analysis
  • Integrated ionizer for effective SNMS analysis
  • Selection of differentially pumped primary excitation sources
  • IG20 Gas, IG5C Caesium, IFG200 FAB or high-performance liquid gallium guns
  • Signal gating and integral ion gun raster control for depth profiling
  • In insulator studies, the electron flood cannon option for charge neutralization
  • Vacuum chamber bakeout heaters.

Applications

  • Flexible Solar Cell
  • UHV Surface Science
  • Nuclear Materials
  • SIMS Surface Analysis and SNMS Surface Analysis
  • Electronic Materials.

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