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Establishment of High Safety Lithium Battery STOBA Consortium by ITRI

Taiwan's Industrial Technology Research Institute (ITRI), which has been emphasizing the R&D of electric vehicles and green energy, announced the establishment of the High Safety Lithium Battery STOBA Consortium and also unveiled the STOBA logo to establish a new standard.

16 Apr 2010

Australia to Send Trade Delegation to NSTI Nanotech

The Small Technologies Cluster Ltd (STC), Melbourne, Australia have recently announced they are leading an Australian delegation to the US National Science and Technology Institute (NSTI) Nanotech Conference and Expo 2010 from June 21-25 at the Anaheim Convention Centre, Anaheim, CA.

16 Apr 2010

Malvern Zetasizer Nano Essential for Protein Aggregation Studies at USF

Dr Martin Muschol, Assistant Professor at the University of South Florida's (USF) Department of Physics and his team are carrying out important research to gain a better understanding of protein aggregation phenomena, including protein crystallization and amyloid fibril growth.

From Malvern Panalytical 15 Apr 2010

IntertechPira and NanoCentral Announce Programme for NanoMaterials 2010

IntertechPira and NanoCentral are pleased to announce the programme for the 4th edition of NanoMaterials - the leading event focusing on the commercialisation of nanomaterials.

15 Apr 2010

Arkema Highlights Wide Range of Products Used in the Coatings Industry at ACS 2010

At ACS 2010, from April 13 to 15, Arkema company will highlight a wide range of products used in the coatings industry at its booth. With its global and customer-focused approach, internationally recognized brands an...

From American Chemical Society 14 Apr 2010

Significant Advance in Preparation of Large Planar Cross Sections for Microscopic Imaging and Microanalysis

Gatan, Inc. is pleased to introduce the NEW Ilion+™, a significant advance in the preparation of large planar cross sections for microscopic imaging and microanalysis. The Ilion+ is a dedicated, ion beam based system for the preparation of large area planar cross sections from challenging SEM samples.

14 Apr 2010

Micralyne Certified to ISO 13485

The certification complements Micralyne's current ISO 9001:2008 certification and makes the company one of the only MEMS solution providers with the quality assurance certification to develop and manufacture MEMS and...

From Micralyne Inc. 14 Apr 2010

Three New Companies Join eBeam Initiative

The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the lat...

14 Apr 2010

TSMC Skips 22nm Manufacturing Process Node and Move Directly to 20nm Technology

Taiwan Semiconductor Manufacturing Company, Ltd. (TWSE: 2330, NYSE: TSM) announced today at its 2010 Technology Symposium that it will skip the 22nm manufacturing process node and move directly to a 20nm technology. The move is value driven to make advanced technology a more viable alternative for its customers.

From TSMC Taiwan Semiconductor Manufacturing Company 13 Apr 2010