Incorporated, a leading supplier of advanced metrology
equipment to the semiconductor industry, today introduced the latest
addition to its Atlas® metrology system platform, the Atlas XP.
“We are committed to aligning our product and
technology roadmaps to industry timelines and customer
requirements,” said Dr. Timothy J. Stultz,
Nanometrics’ president and chief executive officer.
“With advanced technology and system capabilities, the Atlas
XP delivers leading edge performance to our customers, enabling them to
meet their own technology and competitive challenges.”
The Atlas XP incorporates a number of system improvements
which result in smaller target measurement capabilities, increased
precision, and improved long-term measurement stability and system
reliability. Combining the very latest small spot UV Spectroscopic
Ellipsometer (SE) and Normal Incidence Spectroscopic Reflectometry
(SR), the Atlas XP addresses 45nm and 32nm precision and fleet matching
“The addition of the Atlas XP extends value and
continuity to existing customers transitioning to next level technology
nodes,” said David Doyle, Nanometrics’ director of
Standalone Metrology Business. “Nanometrics offers the best
combination of high performance technology, low cost of ownership and
product extendibility. This has been the cornerstone of our development
According to the company, the Atlas XP is designed to enable
existing customers to seamlessly upgrade through modular system upgrade
packages. This allows previous generation system owners the opportunity
to immediately realize the most current product enhancements for their
thin film and OCD metrology applications.
Like its predecessor, the Atlas XP system is also designed to
easily incorporate Nanometrics’ latest NanoCD™
Suite, a turnkey OCD metrology application. Together, this
implementation addresses the most demanding OCD applications on a
single system platform that leverages the combination of both SE and SR
technologies in the measurement.