A process to rival traditional lithography approaches, and which can be used to create microwire networks, is now a step closer to real applicability in future electronics. By optimizing the processing conditions for 'evaporative lithography', a research team from Singapore and Australia has maximized the connectivity and conductivity of the microwire networks that conduct electricity.
“Evaporative lithography could offer a cost-effective and environmentally friendly bench-top alternative to existing lithographic techniques such as photolithography, soft lithography and nanoimprinting,” says team member Ivan Vakarelski from the A*STAR Institute of Chemical and Engineering Sciences, Singapore. He explains that the team is aiming primarily at creating large conducting microwire networks that, when deposited onto a glass substrate, could be used as transparent electrodes. These could be an alternative to the industry standard of indium tin oxide coatings, which would help circumvent the high cost and limited supply of indium.
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