Grenoble-based InfiniScale and CEA-Leti have signed a multi-year joint venture to concentrate on process-variability monitoring in aggressive technologies such as SOI sub-28 nm systems.
InfiniScale, supplier of customized parametrical output analysis and maximization for analog and mixed-signal applications, will supply its Lysis solution for modeling and output maximization of design-kit libraries. The company will also help design a solution to solve process inconsistency issues. The collaboration will utilize Leti’s technological and design know-how to offer InfiniScale access to fully depleted silicon on insulator technology to confirm InfiniScale equipment dimensions on silicon.
Ahmed Jerraya, Program Manager for hardware/software integration at Leti, stated that the partnership is a result of the company’s decision to provide developers access to its fully depleted silicon on insulator technology. Collaborating with InfiniScale will enhance its design-equipment with design kit libraries of maximal output circuit blocks.
Firas Mohamed, Founder and Chief Executive Officer of InfiniScale, stated that the partnership allows process variability to become crucial at multi-levels and the fully depleted silicon on insulator technology is vital for semiconductor companies evolving constantly.