Akrion Systems, a provider of advanced surface preparation systems and processes for solar device and microelectronics manufacturers, has garnered over $20 million worth of orders from MEMS manufacturers.
The company’s DIO3 ozonated-water cleaning method is a patented method which can be used in place of sulfuric acid for applications involving organic removal. The ICE-1, a patented chemical concentration control process and the i-Clean in situ processing are notable innovations of the company. Akrion Systems has developed innovative methods and equipment for enhanced particle removal, uniform and controlled silicon etching. It can dry and process wafers having high aspect ratio features. MEMS manufacturers around the world utilize Akrion’s GAMA batch-immersion systems for their innovations.
The Canadian Centre de Collaboration MiQro Innovation (C2MI) located in Bromont Technoparc, Quebec is to receive Akrion’s GAMA wet stations, and the equipment would be installed before the year ends. The company would also ship the GAMA wet stations to other major MEMS device suppliers in Southeast Asia and in Europe.
Akrion Systems’ CEO and president, Michael Ioannou, said that the company’s sales increased rapidly in 2011, and that they have received more orders from both new and existing MEMS customers. New and existing customers acknowledge the company’s rich experience and extensive knowledge in enabling them to discover solutions to several challenges posed with advanced MEMS devices manufacture.
Source: http://www.akrionsystems.com/