Raith, a leading international technology supplier for nanofabrication, electron and ion beam lithography equipment, will introduce its new corporate design to the public at the 40th Micro and Nano Engineering conference in Lausanne, Switzerland.
18 months after joining forces with Vistec Gaussian Beam Lithography, both companies are now united under a new Raith brand that stands for the most complete, comprehensive range of nanofabrication instruments. Starting with an ELPHY lithography upgrade kit, advancing with flexible multi-technique systems and culminating in the EBPG and VOYAGER dedicated electron beam lithography systems, Raith offers the right solutions for all nanofabrication tasks from academic research up to specific production levels.
MNE visitors are invited to experience the new logo and the company´s new look and feel at the Raith booth. Users may participate in two product-specific user meetings as in previous years. Simultaneously, Raith´s new web presence will be available to the public at www.raith.com.
During the first year after Raith and Vistec joined forces, our clients already benefited from the broad product portfolio and the largest support infrastructure within our nanofabrication business field worldwide. With the new corporate design, we are finally able to express the successful integration of the two complementing companies.
Dr. Ralf Jede, CEO of Raith GmbH
“The new common corporate design is another milestone in our ongoing merger activities. As a result of these activities, our customers have already expressed their satisfaction about the stability and extended resources of the joint company. A reinforced company, enabling a lifetime partnership that warrants the customers´ investments,” says Erwin Mueller, CEO of Raith B.V. (former Vistec Lithography B.V.).