Luminescent Technologies, Inc., the pioneer and first-to-market provider of computational lithography solutions for the global semiconductor industry, continues to advance its lead, with six major semiconductor manufacturers in Europe, Japan, Korea, Taiwan, and the US now using its Inverse Lithography Technology (ILT) to develop computational solutions in a mix of environments -- from production at the 50- nm node to development at 36-nm, 28-nm and 22-nm nodes. Customers include DRAM, logic and microprocessor leaders who are tapping ILT's unique capabilities as they implement lithography solutions for their difficult or otherwise impossible to manufacture cutting-edge products.
The accelerating adoption of ILT for development and production use over the past two years follows extensive benchmarking and evaluation by Luminescent's customers. Now more than ever, these leading-edge manufacturers are seeking powerful software solutions to advance their lithography strategies. With Luminescent's flagship product, the Inverse Explorer(TM), they benefit from the industry's most advanced and comprehensive computational solutions, including source-mask optimization (SMO), model-based sub- resolution assist feature (SRAF) generation, and automated design rule development. These capabilities are required for semiconductor manufacturers to develop lithography processes that not only optimize manufacturing yields at current nodes, but also bridge the lithography gap across several future device generations.
"Since 2007, through our collaborative work with industry leaders, we have developed Inverse Explorer into a tool that semiconductor companies now consider indispensable for their leading-edge designs," said Dr. Moris Kori, President and CEO of Luminescent Technologies.
Computational lithography (or computational scaling) is based on using mathematical models to improve the resolution of light across a critical layer of an integrated circuit (IC). It has become the most viable and economic approach for extending 193-nm wavelength lithography through at least the 22- nm generation. Its successful commercialization by early pioneer, Luminescent, means that for the first time in the history of the semiconductor industry, Moore's law is being enabled by software innovation rather than advances in hardware-centric lithography technologies.
"Customers confirm that the capabilities of our Inverse Explorer tool are unmatched by any other computational lithography tool on the market. Thanks to ongoing collaboration with these semiconductor manufacturers, we continue to expand the Explorer's unique capabilities, giving the industry a powerful and affordable solution that enables the migration to future manufacturing nodes using 193-nm lithography hardware", added Kori.
Luminescent executives will be present at SPIE Advanced Lithography 2009, to be held in San Jose, Calif., Feb. 22-27. To schedule a meeting at the conference, please email Tom Chang at [email protected]