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Superabsorbing Design Boosts Light Absorption Efficiency of Thin Film Solar Cells

Researchers from North Carolina State University have developed a "superabsorbing" design that may significantly improve the light absorption efficiency of thin film solar cells and drive down manufacturing costs.

From North Carolina State University 27 Feb 2014

Vistec SB254 System Purchased By Fraunhofer ENAS

Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced that Fraunhofer ENAS in Chemnitz has purchased a Variable Shaped Beam system Vistec SB254. The Fraunhofer Institute for Elect...

From Vistec Electron Beam 25 Feb 2014

SOKUDO DUO 450mm Coat/Develop Track System Selected by G450C for Immersion ArF Lithography and DSA Applications

Dainippon Screen Mfg. has confirmed our subsidiary company’s SOKUDO DUO 450mm coat/develop track system has been chosen by the Global 450mm Consortium (G450C), headquartered at the SUNY College of Nanoscale Science and Engineering (CNSE) in Albany, New York, for immersion ArF lithography and Directed Self-Assembly (DSA) applications.

24 Feb 2014

SUNY CNSE to Present Nanotechnology-Based Research at SPIE Advanced Lithography 2014

The SUNY College of Nanoscale Science and Engineering (CNSE) announced that its globally recognized, nanotechnology-based research will be featured at the world’s leading lithography forum, with nearly two dozen technical papers accepted for presentation at SPIE Advanced Lithography 2014, held annually in California.

24 Feb 2014

ZEISS Reports Significant Progress in Development of Actinic Aerial Image Metrology System EUV

A new laser developed by a research group at Caltech holds the potential to increase by orders of magnitude the rate of data transmission in the optical-fiber network—the backbone of the Internet.

21 Feb 2014

Nikon’s NSR-S630D ArF Immersion Scanner Extends 193 nm Immersion Lithography

Nikon Corporation introduces the NSR-S630D ArF immersion scanner, delivering world-class performance and productivity for 10 nm manufacturing and beyond. The S630D builds on the advanced Streamlign platform to deliver ground-breaking solutions to extend 193 nm immersion lithography.

21 Feb 2014

Canon to Acquire Molecular Imprints’ Lithography Equipment Business

Molecular Imprints Inc., founded in 2001 by Cockrell School of Engineering professors S.V. Sreenivasan and Grant Willson, recently announced that Canon Inc. will purchase its semiconductor imprint lithography equipment business. Molecular Imprints’ innovative technology is the result of extensive research conducted at the Cockrell School and is a successful example of how UT Austin ingenuity is shaping the future of the nanomanufacturing industry.

18 Feb 2014

G450C to Utilize Gigaphoton Laser for 450mm ArF Immersion Lithography Scanners

Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company’s flagship high-power ArF Immersion Laser (GT64A) will be used by the Global 450 Consortium (G450C), headquartered at SUNY’s College of Nanoscale Science and Engineering (CNSE) in Albany, New York, as the light source for its first 450mm ArF Immersion lithography scanners.

18 Feb 2014

Gigaphoton Achieves 43W Output at 100kHz from LPP Light Source

Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has achieved 43W output at 100kHz from its second prototype laser-produced plasma (LPP) light source for EUV lithography scanners.

17 Feb 2014

Molecular Imprints to Sell Semiconductor Imprint Lithography Equipment Business to Canon

Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical lithography platforms.

14 Feb 2014